脉冲激光直接写入GaInAs/GaInAsP量子阱中的光栅

B. Ooi, E. L. Portnoi, C. J. McLean, A. McKee, C.C. Bunon, A. C. Bryce, Richard M. De La Rue, J. Marsh
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引用次数: 3

摘要

提出了一种新的量子阱混合技术,即用高能激光脉冲照射多个量子阱材料并产生瞬态加热。采用调q Nd:YAG激光器,脉冲长度为/spl sim/7 ns,重复频率为10 Hz,脉冲能量密度为/spl sim/5 mJ mm/sup -2/,使点缺陷的密度局部增加。随后在快速热处理器中退火后,观察到超过100 nm的带隙位移。用金属掩膜对样品进行屏蔽,研究了样品的空间分辨率。空间分辨光致发光测量表明,该过程的分辨率为25 /spl mu/m或更高,但该测量受光致发光装置分辨率的限制。将孔径为2.5 /spl mu/m的光栅湿蚀刻在波导样品的背面,样品通过光栅辐照并进行退火处理。波导透射光谱显示,在1.525 /spl mu/m波长附近,透射强度下降,表明光栅已经形成。
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Direct writing of gratings in GaInAs/GaInAsP quantum wells using pulsed laser irradiation
A new quantum well intermixing technique, which involves irradiating multiple quantum well material with high energy laser pulses and producing transient heating, has been developed. A Q-switched Nd:YAG laser with pulse length of /spl sim/7 ns, repetition rate of 10 Hz and pulse energy density /spl sim/5 mJ mm/sup -2/ is used to generate a localised increase in the density of point defects. After subsequent annealing in a rapid thermal processor bandgap shifts of over 100 nm were observed. The spatial resolution was investigated by masking the sample with a metal mask. Spatially resolved photoluminescence measurements showed that the resolution of the process was 25 /spl mu/m or better, this measurement being limited by the resolution of the photoluminescence set up. Gratings, with a pitch of 2.5 /spl mu/m, were wet-etched into the back of waveguide samples, and the samples were irradiated through the grating and annealed as before. Waveguide transmission spectra showed a dip in the transmitted intensity around a wavelength of 1.525 /spl mu/m indicating that a grating had been formed.
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