纳米尺度无掺杂环栅mosfet的完整载流子非电荷片分析理论

Jin He, Xing Zhang, Ganggang Zhang, M. Chan, Yangyuan Wang
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引用次数: 10

摘要

基于基本器件物理学,提出了一种完整的纳米尺度无掺杂环栅mosfet的载流子非电荷片分析理论。该公式是基于泊松方程直接求解移动载流子——电子浓度的。因此,在远离表面的沟道中,电势、场和电荷密度的分布也可以用载流子浓度来表示,从而给出了包含短沟道效应的纳米尺度无掺杂环栅mosfet的基于载流子的非电荷片模型。该公式理论具有解析形式,不需要像传统的表面势模型或经典的Pao-Sah公式那样求解超越方程。因此,该理论可以解析地预测未掺杂的mosfet的解析IV和CV特性。通过与三维数值模拟的广泛对比,验证了理论结果的有效性
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A complete carrier-based non-charge-sheet analytic theory for nano-scale undoped surrounding-gate MOSFETs
A complete carrier-based non-charge-sheet analytic theory for the nano-scale undoped surrounding-gate MOSFETs is presented in this paper based on the basic device physics. The formulation is based on the Poisson's equation to solve directly for the mobile carrier-the electron concentration. Therefore, the distribution of the potential, the field and the charge density in the channel away from the surface is also expressed in terms of the carrier concentration, giving a carrier-based non-charge-sheet model for nano-scale undoped surrounding-gate MOSFETs including the short-channel effects. The formulated theory has an analytic form that does not need to solve the transcendent equation as in the conventional surface potential model or classical Pao-Sah formulation. As a result, the theory can analytically predict the analytical IV and CV characteristics of the undoped surrounding-gate MOSFETs. The validity of the theory results has also been demonstrated by extensive comparison with 3D numerical simulation
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