M. Rodwell, Q. Lee, D. Mensa, J. Guthrie, Y. Betser, S. Martin, R.P. Smith, S. Jaganathan, T. Mathew, P. Krishnan, C. Serhan, S. Long
{"title":"转移衬底异质结双极晶体管集成电路技术","authors":"M. Rodwell, Q. Lee, D. Mensa, J. Guthrie, Y. Betser, S. Martin, R.P. Smith, S. Jaganathan, T. Mathew, P. Krishnan, C. Serhan, S. Long","doi":"10.1109/ICIPRM.1999.773661","DOIUrl":null,"url":null,"abstract":"Using substrate transfer processes, we have fabricated heterojunction bipolar transistors with 0.4 /spl mu/m emitter-base and collector-base junctions, minimizing RC parasitics and increasing f/sub max/ to 820 GHz, the highest yet reported for a transistor. The process provides microstrip interconnects on a low-/spl epsiv//sub /spl tau// polymer dielectric with a electroplated copper ground plane and substrate. Substrate thermal resistance is reduced 5:1 over InP. Important wiring parasitics, including wiring capacitance, ground via inductance, and IC-package ground-return inductance, are substantially reduced. Demonstrated ICs include lumped and distributed amplifiers with bandwidths to 85 GHz, master-slave flip-flops operable at over 48 GHz, and 50 GHz AGC/limiting amplifiers. Current efforts include further improvement in bandwidth, development of power devices, and demonstration of more complex mixed-signal ICs.","PeriodicalId":213868,"journal":{"name":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","volume":"26 17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":"{\"title\":\"Transferred-substrate heterojunction bipolar transistor integrated circuit technology\",\"authors\":\"M. Rodwell, Q. Lee, D. Mensa, J. Guthrie, Y. Betser, S. Martin, R.P. Smith, S. Jaganathan, T. Mathew, P. Krishnan, C. Serhan, S. Long\",\"doi\":\"10.1109/ICIPRM.1999.773661\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Using substrate transfer processes, we have fabricated heterojunction bipolar transistors with 0.4 /spl mu/m emitter-base and collector-base junctions, minimizing RC parasitics and increasing f/sub max/ to 820 GHz, the highest yet reported for a transistor. The process provides microstrip interconnects on a low-/spl epsiv//sub /spl tau// polymer dielectric with a electroplated copper ground plane and substrate. Substrate thermal resistance is reduced 5:1 over InP. Important wiring parasitics, including wiring capacitance, ground via inductance, and IC-package ground-return inductance, are substantially reduced. Demonstrated ICs include lumped and distributed amplifiers with bandwidths to 85 GHz, master-slave flip-flops operable at over 48 GHz, and 50 GHz AGC/limiting amplifiers. Current efforts include further improvement in bandwidth, development of power devices, and demonstration of more complex mixed-signal ICs.\",\"PeriodicalId\":213868,\"journal\":{\"name\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"volume\":\"26 17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1999.773661\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1999.773661","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Using substrate transfer processes, we have fabricated heterojunction bipolar transistors with 0.4 /spl mu/m emitter-base and collector-base junctions, minimizing RC parasitics and increasing f/sub max/ to 820 GHz, the highest yet reported for a transistor. The process provides microstrip interconnects on a low-/spl epsiv//sub /spl tau// polymer dielectric with a electroplated copper ground plane and substrate. Substrate thermal resistance is reduced 5:1 over InP. Important wiring parasitics, including wiring capacitance, ground via inductance, and IC-package ground-return inductance, are substantially reduced. Demonstrated ICs include lumped and distributed amplifiers with bandwidths to 85 GHz, master-slave flip-flops operable at over 48 GHz, and 50 GHz AGC/limiting amplifiers. Current efforts include further improvement in bandwidth, development of power devices, and demonstration of more complex mixed-signal ICs.