具有单电子纳米晶体存储的低功耗77 K纳米存储器

S. Tiwari, F. Rana, Wei Chen, K. Chan, H. Hanafi
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引用次数: 3

摘要

我们提出了一种阈值移动纳米存储器的实验结果。观察结果与纳米晶体中的单电子存储一致,并提供了77k库仑封锁的可能证据。纳米存储器由硅场效应晶体管组成,硅纳米晶体放置在栅极氧化物中,靠近反转表面。电子电荷存储在这些孤立的5-10 nm大小的纳米晶体中,这些纳米晶体彼此之间有>5 nm的SiO/sub -2 /,并且与衬底表面的反转层之间有< 2 nm的SiO/sub -2 /。电荷从反转层注入,其在纳米晶体中的存储引起阈值电压的移动,这是通过电流检测的。这种阈值位移的大小与纳米晶体中的电荷、氧化物厚度和其他器件参数有关。这项工作的独特之处在于,这是第一个在主流硅技术中使用单电子存储的存储器,它在低功率下工作,但不牺牲实际存储器技术所需的驱动电流、再现性和噪声裕度。通过利用3nm尺寸的纳米晶体中可疑的库仑封锁行为,也应该有可能将这一概念扩展到室温。
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A low power 77 K nano-memory with single electron nano-crystal storage
We present experimental results of a threshold-shifting nano-memory. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockade at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO/sub 2/ and from the inversion layer on the substrate surface by sub-2 nm of SiO/sub 2/. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters. The uniqueness of this work is that this is the first memory utilizing single electron storage in a mainstream silicon technology which operates at low powers and yet does not sacrifice the drive current, reproducibility, and noise margin needs of a practical memory technology. It should also be possible to extend the concept to room temperature by utilizing the suspected Coulomb blockade behavior in nanocrystals of 3 nm size.
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