{"title":"具有单电子纳米晶体存储的低功耗77 K纳米存储器","authors":"S. Tiwari, F. Rana, Wei Chen, K. Chan, H. Hanafi","doi":"10.1109/DRC.1995.496266","DOIUrl":null,"url":null,"abstract":"We present experimental results of a threshold-shifting nano-memory. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockade at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO/sub 2/ and from the inversion layer on the substrate surface by sub-2 nm of SiO/sub 2/. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters. The uniqueness of this work is that this is the first memory utilizing single electron storage in a mainstream silicon technology which operates at low powers and yet does not sacrifice the drive current, reproducibility, and noise margin needs of a practical memory technology. It should also be possible to extend the concept to room temperature by utilizing the suspected Coulomb blockade behavior in nanocrystals of 3 nm size.","PeriodicalId":326645,"journal":{"name":"1995 53rd Annual Device Research Conference Digest","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"A low power 77 K nano-memory with single electron nano-crystal storage\",\"authors\":\"S. Tiwari, F. Rana, Wei Chen, K. Chan, H. Hanafi\",\"doi\":\"10.1109/DRC.1995.496266\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present experimental results of a threshold-shifting nano-memory. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockade at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO/sub 2/ and from the inversion layer on the substrate surface by sub-2 nm of SiO/sub 2/. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters. The uniqueness of this work is that this is the first memory utilizing single electron storage in a mainstream silicon technology which operates at low powers and yet does not sacrifice the drive current, reproducibility, and noise margin needs of a practical memory technology. It should also be possible to extend the concept to room temperature by utilizing the suspected Coulomb blockade behavior in nanocrystals of 3 nm size.\",\"PeriodicalId\":326645,\"journal\":{\"name\":\"1995 53rd Annual Device Research Conference Digest\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1995 53rd Annual Device Research Conference Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1995.496266\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 53rd Annual Device Research Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1995.496266","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A low power 77 K nano-memory with single electron nano-crystal storage
We present experimental results of a threshold-shifting nano-memory. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockade at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO/sub 2/ and from the inversion layer on the substrate surface by sub-2 nm of SiO/sub 2/. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters. The uniqueness of this work is that this is the first memory utilizing single electron storage in a mainstream silicon technology which operates at low powers and yet does not sacrifice the drive current, reproducibility, and noise margin needs of a practical memory technology. It should also be possible to extend the concept to room temperature by utilizing the suspected Coulomb blockade behavior in nanocrystals of 3 nm size.