曲径型lpe - p和GaInAsP层生长的新方法

D. Nohavica, P. Gladkov, M. Lourenço, Z. Yang, K. Homewood, D. Ehrentraut
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引用次数: 0

摘要

采用曲径型液相外延技术在GaInAsP/InP材料体系中制备季系固溶体。比较了曲流型LPE与常规LPE制备的层的表面形貌。在(100)取向的InP衬底上生长出成分接近Ga/sub .21/In/sub .79/As/sub .75/P/sub .25/的四元应变层,其垂直晶格失配在压缩条件下高达1.6%。为了修复生长界面,对外延技术进行了改进。用InP生长法检验改性效果。
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Meander type LPE-new approach to growth InP and GaInAsP layers
The meander type technique of liquid phase epitaxy (LPE) is used for preparation of quaternary solid solution in GaInAsP/InP material system. Surface morphology of the layers prepared by meander type LPE has been compared with ones prepared by conventional LPE. Quaternary strained layers with composition near to Ga/sub .21/In/sub .79/As/sub .75/P/sub .25/ were grown with perpendicular lattice mismatch up to 1.6% in compression, on the InP substrates of (100) orientation. The used epitaxial technique has been modified for perspective attempt to heal the growth interfaces. Modification was tested by InP growth.
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