{"title":"钛颗粒导致的单比特单元SRAM故障","authors":"Rachel Siew, W. F. Kho","doi":"10.1109/IPFA.2014.6898134","DOIUrl":null,"url":null,"abstract":"A single bit cell SRAM failure with shorted bit line (BL) and bit line bar (BLB) storage nodes were analyzed. Instead of using top down deprocessing to localize the defect, a modified approach incorporating Atomic Force Probe (AFP) and STEM dark field imaging of a thick sample were used. Using the modified approach the single bit cell failure was found to be due to a titanium particle on the spacer of a transistor that shorted the polysilicon gate and active silicon.","PeriodicalId":409316,"journal":{"name":"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Single bit cell SRAM failure due to titanium particle\",\"authors\":\"Rachel Siew, W. F. Kho\",\"doi\":\"10.1109/IPFA.2014.6898134\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A single bit cell SRAM failure with shorted bit line (BL) and bit line bar (BLB) storage nodes were analyzed. Instead of using top down deprocessing to localize the defect, a modified approach incorporating Atomic Force Probe (AFP) and STEM dark field imaging of a thick sample were used. Using the modified approach the single bit cell failure was found to be due to a titanium particle on the spacer of a transistor that shorted the polysilicon gate and active silicon.\",\"PeriodicalId\":409316,\"journal\":{\"name\":\"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA.2014.6898134\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2014.6898134","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Single bit cell SRAM failure due to titanium particle
A single bit cell SRAM failure with shorted bit line (BL) and bit line bar (BLB) storage nodes were analyzed. Instead of using top down deprocessing to localize the defect, a modified approach incorporating Atomic Force Probe (AFP) and STEM dark field imaging of a thick sample were used. Using the modified approach the single bit cell failure was found to be due to a titanium particle on the spacer of a transistor that shorted the polysilicon gate and active silicon.