M. Claus, A. Fediai, S. Mothes, A. Pacheco, D. Ryndyk, S. Blawid, G. Cuniberti, M. Schroter
{"title":"金属-碳纳米管界面的多尺度建模","authors":"M. Claus, A. Fediai, S. Mothes, A. Pacheco, D. Ryndyk, S. Blawid, G. Cuniberti, M. Schroter","doi":"10.1109/IWCE.2015.7301946","DOIUrl":null,"url":null,"abstract":"The authors studied the impact of contact materials on CNTFET behavior using multiscale modeling and simulation framework. A strong correlation between metal-CNT coupling strength, contact length and contact resistance was found. The atomistic simulation was used to adjust the contact model used within the transport studies at the device level.","PeriodicalId":165023,"journal":{"name":"2015 International Workshop on Computational Electronics (IWCE)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Multi-scale modeling of metal-CNT interfaces\",\"authors\":\"M. Claus, A. Fediai, S. Mothes, A. Pacheco, D. Ryndyk, S. Blawid, G. Cuniberti, M. Schroter\",\"doi\":\"10.1109/IWCE.2015.7301946\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The authors studied the impact of contact materials on CNTFET behavior using multiscale modeling and simulation framework. A strong correlation between metal-CNT coupling strength, contact length and contact resistance was found. The atomistic simulation was used to adjust the contact model used within the transport studies at the device level.\",\"PeriodicalId\":165023,\"journal\":{\"name\":\"2015 International Workshop on Computational Electronics (IWCE)\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 International Workshop on Computational Electronics (IWCE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWCE.2015.7301946\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 International Workshop on Computational Electronics (IWCE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWCE.2015.7301946","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The authors studied the impact of contact materials on CNTFET behavior using multiscale modeling and simulation framework. A strong correlation between metal-CNT coupling strength, contact length and contact resistance was found. The atomistic simulation was used to adjust the contact model used within the transport studies at the device level.