场发射用锌薄膜生长ZnO纳米线

M. Dantas, Denise C. Souza, Alejandro A. Zúñiga-Páez, Wellington A. A. Silva, E. Galeazzo, H. Peres, M. M. Kopelvski
{"title":"场发射用锌薄膜生长ZnO纳米线","authors":"M. Dantas, Denise C. Souza, Alejandro A. Zúñiga-Páez, Wellington A. A. Silva, E. Galeazzo, H. Peres, M. M. Kopelvski","doi":"10.1109/SBMicro.2019.8919388","DOIUrl":null,"url":null,"abstract":"Zinc oxide (ZnO) has attracted considerable interest for a wide range of applications, including its use as an active layer in gas sensor devices and as promising emitters for field emission devices. This paper explores ZnO nanowires growth through thermal oxidation of zinc thin films deposited over glass substrates. We applied this low-complexity IC-compatible procedure for fabricating field emission cathodes. Raman Spectroscopy and Scanning Electron Microscopy show that the processes applied succeeded in obtaining nanoscale structures of ZnO with dimensions up to 4 micrometers in length and 30-100 nanometers in diameter. This study also investigated field emission characteristics of these ZnO nanowires. Electrical characterization showed an intense electron field emission with good uniformity of the emitted current on the active area of the device, with a low turn-on electric field (2.4 volts/micrometer). These results demonstrate that the low-complex fabrication procedures adopted as well as the ZnO nanomaterial itself are suitable for FE devices development.","PeriodicalId":403446,"journal":{"name":"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"ZnO Nanowires Growth from Thin Zinc Films for Field Emission Purposes\",\"authors\":\"M. Dantas, Denise C. Souza, Alejandro A. Zúñiga-Páez, Wellington A. A. Silva, E. Galeazzo, H. Peres, M. M. Kopelvski\",\"doi\":\"10.1109/SBMicro.2019.8919388\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Zinc oxide (ZnO) has attracted considerable interest for a wide range of applications, including its use as an active layer in gas sensor devices and as promising emitters for field emission devices. This paper explores ZnO nanowires growth through thermal oxidation of zinc thin films deposited over glass substrates. We applied this low-complexity IC-compatible procedure for fabricating field emission cathodes. Raman Spectroscopy and Scanning Electron Microscopy show that the processes applied succeeded in obtaining nanoscale structures of ZnO with dimensions up to 4 micrometers in length and 30-100 nanometers in diameter. This study also investigated field emission characteristics of these ZnO nanowires. Electrical characterization showed an intense electron field emission with good uniformity of the emitted current on the active area of the device, with a low turn-on electric field (2.4 volts/micrometer). These results demonstrate that the low-complex fabrication procedures adopted as well as the ZnO nanomaterial itself are suitable for FE devices development.\",\"PeriodicalId\":403446,\"journal\":{\"name\":\"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SBMicro.2019.8919388\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 34th Symposium on Microelectronics Technology and Devices (SBMicro)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SBMicro.2019.8919388","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

氧化锌(ZnO)的广泛应用引起了人们的极大兴趣,包括作为气体传感器器件的有源层和作为场发射器件的有前途的发射器。本文探讨了通过热氧化沉积在玻璃衬底上的锌薄膜生长ZnO纳米线的方法。我们将这种低复杂度的集成电路兼容工艺应用于制造场发射阴极。拉曼光谱和扫描电子显微镜显示,所采用的工艺成功地获得了长度达4微米,直径达30-100纳米的ZnO纳米级结构。本研究还研究了这些ZnO纳米线的场发射特性。电学表征表明,器件有源区域的电子场发射强度强,发射电流均匀性好,导通电场低(2.4伏/微米)。这些结果表明,所采用的低复杂度制造工艺以及ZnO纳米材料本身适合于FE器件的开发。
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ZnO Nanowires Growth from Thin Zinc Films for Field Emission Purposes
Zinc oxide (ZnO) has attracted considerable interest for a wide range of applications, including its use as an active layer in gas sensor devices and as promising emitters for field emission devices. This paper explores ZnO nanowires growth through thermal oxidation of zinc thin films deposited over glass substrates. We applied this low-complexity IC-compatible procedure for fabricating field emission cathodes. Raman Spectroscopy and Scanning Electron Microscopy show that the processes applied succeeded in obtaining nanoscale structures of ZnO with dimensions up to 4 micrometers in length and 30-100 nanometers in diameter. This study also investigated field emission characteristics of these ZnO nanowires. Electrical characterization showed an intense electron field emission with good uniformity of the emitted current on the active area of the device, with a low turn-on electric field (2.4 volts/micrometer). These results demonstrate that the low-complex fabrication procedures adopted as well as the ZnO nanomaterial itself are suitable for FE devices development.
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