Russell McCabe, R. Chaudhuri, S. Spangler, Lauren Kerstetter, Femi Aborisade, Raita Hoech
{"title":"大批量生产中减少CMP变化的多阶段工艺优化","authors":"Russell McCabe, R. Chaudhuri, S. Spangler, Lauren Kerstetter, Femi Aborisade, Raita Hoech","doi":"10.1109/asmc54647.2022.9792519","DOIUrl":null,"url":null,"abstract":"Reducing reworks in manufacturing process is important for product quality, as well cycle time and cost impact. Contact oxide stop on film process has historically had one of the higher rework percentages due to underpolish. Variation in the process from various sources leading to thickness variation and challenges in process control, lead to these reworks. A multiple phase process conversion was started with intent of reducing cost, as well as reducing process variation, that results in the reworks.","PeriodicalId":436890,"journal":{"name":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Multiphased Process Optimization for CMP Variation Reduction in High Volume Manufacturing\",\"authors\":\"Russell McCabe, R. Chaudhuri, S. Spangler, Lauren Kerstetter, Femi Aborisade, Raita Hoech\",\"doi\":\"10.1109/asmc54647.2022.9792519\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Reducing reworks in manufacturing process is important for product quality, as well cycle time and cost impact. Contact oxide stop on film process has historically had one of the higher rework percentages due to underpolish. Variation in the process from various sources leading to thickness variation and challenges in process control, lead to these reworks. A multiple phase process conversion was started with intent of reducing cost, as well as reducing process variation, that results in the reworks.\",\"PeriodicalId\":436890,\"journal\":{\"name\":\"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-05-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/asmc54647.2022.9792519\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/asmc54647.2022.9792519","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Multiphased Process Optimization for CMP Variation Reduction in High Volume Manufacturing
Reducing reworks in manufacturing process is important for product quality, as well cycle time and cost impact. Contact oxide stop on film process has historically had one of the higher rework percentages due to underpolish. Variation in the process from various sources leading to thickness variation and challenges in process control, lead to these reworks. A multiple phase process conversion was started with intent of reducing cost, as well as reducing process variation, that results in the reworks.