电源门控SRAM的电源开关栅-氧化物耐受性技术

Hao-I Yang, C. Chuang, W. Hwang
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引用次数: 0

摘要

功率开关的栅极氧化击穿对功率门控SRAM的裕度、稳定性和性能有严重甚至有害的影响。本文提出并评价了几种缓解功率开关栅氧化阻抗的技术,包括在功率开关上增加栅极串联电阻、双阈值电压功率开关、厚栅氧化功率开关和双栅氧化厚度功率开关。结果表明,双栅-氧化物厚度功率开关在保持开关性能的同时,提高了开关的介电击穿时间。
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Power-switch gate-oxide breakdown tolerance techniques for power-gated SRAM
The gate-oxide breakdowns (BD) of the power-switches have severe and even detrimental effects on the margin, stability, and performance of the power-gated SRAM. This paper proposes and evaluates several techniques to mitigate the power-switch gate-oxide BD, including adding a gate series resistance to the power switch, dual threshold voltage power switch, thick gate-oxide power switch, and dual gateoxide thickness power switch. It is shown that dual gate-oxide thickness power switch improves the time-to-dielectric-breakdown of the power switch while maintaining the performance without side effect.
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