{"title":"电源门控SRAM的电源开关栅-氧化物耐受性技术","authors":"Hao-I Yang, C. Chuang, W. Hwang","doi":"10.1109/ICICDT.2010.5510278","DOIUrl":null,"url":null,"abstract":"The gate-oxide breakdowns (BD) of the power-switches have severe and even detrimental effects on the margin, stability, and performance of the power-gated SRAM. This paper proposes and evaluates several techniques to mitigate the power-switch gate-oxide BD, including adding a gate series resistance to the power switch, dual threshold voltage power switch, thick gate-oxide power switch, and dual gateoxide thickness power switch. It is shown that dual gate-oxide thickness power switch improves the time-to-dielectric-breakdown of the power switch while maintaining the performance without side effect.","PeriodicalId":187361,"journal":{"name":"2010 IEEE International Conference on Integrated Circuit Design and Technology","volume":"272 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Power-switch gate-oxide breakdown tolerance techniques for power-gated SRAM\",\"authors\":\"Hao-I Yang, C. Chuang, W. Hwang\",\"doi\":\"10.1109/ICICDT.2010.5510278\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The gate-oxide breakdowns (BD) of the power-switches have severe and even detrimental effects on the margin, stability, and performance of the power-gated SRAM. This paper proposes and evaluates several techniques to mitigate the power-switch gate-oxide BD, including adding a gate series resistance to the power switch, dual threshold voltage power switch, thick gate-oxide power switch, and dual gateoxide thickness power switch. It is shown that dual gate-oxide thickness power switch improves the time-to-dielectric-breakdown of the power switch while maintaining the performance without side effect.\",\"PeriodicalId\":187361,\"journal\":{\"name\":\"2010 IEEE International Conference on Integrated Circuit Design and Technology\",\"volume\":\"272 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE International Conference on Integrated Circuit Design and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICICDT.2010.5510278\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Conference on Integrated Circuit Design and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2010.5510278","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Power-switch gate-oxide breakdown tolerance techniques for power-gated SRAM
The gate-oxide breakdowns (BD) of the power-switches have severe and even detrimental effects on the margin, stability, and performance of the power-gated SRAM. This paper proposes and evaluates several techniques to mitigate the power-switch gate-oxide BD, including adding a gate series resistance to the power switch, dual threshold voltage power switch, thick gate-oxide power switch, and dual gateoxide thickness power switch. It is shown that dual gate-oxide thickness power switch improves the time-to-dielectric-breakdown of the power switch while maintaining the performance without side effect.