{"title":"为什么隧道效应晶体管不工作,如何解决它","authors":"S. Agarwal, E. Yablonovitch","doi":"10.1109/E3S.2013.6705868","DOIUrl":null,"url":null,"abstract":"To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: V<sub>DD</sub> = V<sub>SS</sub> × Log(I<sub>on</sub> /I<sub>off</sub>)+ V<sub>OV</sub>. V<sub>SS</sub> is the subthreshold swing and V<sub>OV</sub> is the overdrive voltage needed to achieve the desired on-current after threshold. V<sub>OV</sub> will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. V<sub>SS</sub> is given by the following model [2]: SS = 1/ η<sub>el</sub> × (1/S<sub>Barrier</sub> + η<sub>conf</sub>/S<sub>DOS</sub>)<sup>-1</sup> (1) η<sub>el</sub> is the electrostatic gate efficiency. η<sub>conf</sub> is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. S<sub>Barrier</sub> represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. S<sub>DOS</sub> is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.","PeriodicalId":231837,"journal":{"name":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Why tunneling FETs don't work, and how to fix it\",\"authors\":\"S. Agarwal, E. Yablonovitch\",\"doi\":\"10.1109/E3S.2013.6705868\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: V<sub>DD</sub> = V<sub>SS</sub> × Log(I<sub>on</sub> /I<sub>off</sub>)+ V<sub>OV</sub>. V<sub>SS</sub> is the subthreshold swing and V<sub>OV</sub> is the overdrive voltage needed to achieve the desired on-current after threshold. V<sub>OV</sub> will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. V<sub>SS</sub> is given by the following model [2]: SS = 1/ η<sub>el</sub> × (1/S<sub>Barrier</sub> + η<sub>conf</sub>/S<sub>DOS</sub>)<sup>-1</sup> (1) η<sub>el</sub> is the electrostatic gate efficiency. η<sub>conf</sub> is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. S<sub>Barrier</sub> represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. S<sub>DOS</sub> is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.\",\"PeriodicalId\":231837,\"journal\":{\"name\":\"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)\",\"volume\":\"69 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/E3S.2013.6705868\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/E3S.2013.6705868","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: VDD = VSS × Log(Ion /Ioff)+ VOV. VSS is the subthreshold swing and VOV is the overdrive voltage needed to achieve the desired on-current after threshold. VOV will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. VSS is given by the following model [2]: SS = 1/ ηel × (1/SBarrier + ηconf/SDOS)-1 (1) ηel is the electrostatic gate efficiency. ηconf is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. SBarrier represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. SDOS is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.