环境变化下快中子辐照对多氮化镓器件可靠性的影响

L. Soriano, H. Valencia, K. Sun, R. Nelson
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引用次数: 5

摘要

抗辐射半导体器件在越来越多的核和空间应用中变得越来越重要。氮化镓(GaN)半导体器件在这方面非常有益。本文报道了高通量快中子辐照下多个AlGaN/GaN深紫外led的电学性能。该实验于2014-2016年在洛斯阿拉莫斯中子科学中心(LANSCE)新增强的束线中进行,在温度变化的半开放式室外房屋中进行了3年的最大辐照量为2.41x1013中子/cm2。我们连续监测了所有GaN器件的I-V特性,并表明随着中子通量的增加,它们保持适当的I-V行为。大量数据分析进一步表明,某一天中子辐照通量增量的影响实际上小于每日温度变化引起的影响。我们的实验结果有助于设计诊断系统,如用于高能量密度物理实验的多像素成像仪,以及必须在高通量辐射和大轨道温度变化中生存的复杂空间电子设备。
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Fast Neutron Irradiation Effects on Multiple Gallium Nitride (GaN) Device Reliability in Presence of Ambient Variations
Radiation-hard semiconductor devices are becoming more important for a growing number of nuclear and space applications. Gallium Nitride (GaN) semiconductor devices can be highly beneficial in this regard. In this paper, we report the electrical performance of multiple AlGaN/GaN deep UV LEDs irradiated by high fluence fast neutrons. The irradiation experiment was conducted in a newly enhanced beamline at the Los Alamos Neutron Science Center (LANSCE) from 2014-2016 with a maximum fluence of 2.41x1013 neutrons/cm2 over a 3-year span, in an temperature varying, semi-open outdoor housing. We continuously monitored the I-V characteristics of all GaN devices, and showed that they maintained proper I-V behaviors as the neutron fluence increased. Extensive data analysis further shows that effects of neutron irradiation fluence increment in a given day are actually smaller than that induced by daily temperature variation. Our experimental results facilitate the design of diagnostics systems such as multi-pixel imagers for high energy density physics experiments, and complex space electronics that must survive through both high fluence radiation and large orbital temperature variations.
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