镍杂质对硅太阳能电池工作参数的影响

Q4 Engineering Russian Microelectronics Pub Date : 2024-06-04 DOI:10.1134/s1063739724600122
Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov
{"title":"镍杂质对硅太阳能电池工作参数的影响","authors":"Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov","doi":"10.1134/s1063739724600122","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~10<sup>11</sup>–10<sup>13</sup> cm<sup>–3</sup>; and in the near-surface layer, ~10<sup>13</sup>–10<sup>15</sup> cm<sup>–3</sup>. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.</p>","PeriodicalId":21534,"journal":{"name":"Russian Microelectronics","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of Nickel Impurity on the Operating Parameters of a Silicon Solar Cell\",\"authors\":\"Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov\",\"doi\":\"10.1134/s1063739724600122\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<h3 data-test=\\\"abstract-sub-heading\\\">Abstract</h3><p>The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~10<sup>11</sup>–10<sup>13</sup> cm<sup>–3</sup>; and in the near-surface layer, ~10<sup>13</sup>–10<sup>15</sup> cm<sup>–3</sup>. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.</p>\",\"PeriodicalId\":21534,\"journal\":{\"name\":\"Russian Microelectronics\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-06-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Russian Microelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1134/s1063739724600122\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Russian Microelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1134/s1063739724600122","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 0

摘要

摘要 研究成果介绍了单晶硅中通过扩散引入的镍杂质对太阳能电池(SC)特性的影响。研究证实,掺入镍原子可使材料中的 MCC 寿命延长两倍,SC 的效率提高 20-25%。研究表明,镍团簇在材料体积中的分布几乎是均匀的,其大小不超过 0.5 μm。团簇在体积中的浓度为 ~1011-1013 cm-3;在近表面层中的浓度为 ~1013-1015 cm-3。揭示了镍原子的体簇和近表面簇对硅 SC 效率影响的物理机制。实验证明,镍原子簇在硅聚合体富镍前表面区域发生的重组活性技术杂质脱碳过程对提高硅聚合体效率起着决定性作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

摘要图片

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Influence of Nickel Impurity on the Operating Parameters of a Silicon Solar Cell

Abstract

The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~1011–1013 cm–3; and in the near-surface layer, ~1013–1015 cm–3. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Russian Microelectronics
Russian Microelectronics Materials Science-Materials Chemistry
CiteScore
0.70
自引率
0.00%
发文量
43
期刊介绍: Russian Microelectronics  covers physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology; dry processing techniques, etching, doping; and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal publishes papers addressing problems of molecular beam epitaxy and related processes; heterojunction devices and integrated circuits; the technology and devices of nanoelectronics; and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, including nanotransistors, and solid state qubits.
期刊最新文献
A Comprehensive Study of Nonuniformity Properties of the LiCoO2 Thin-Film Cathode Fabricated by RF Sputtering Structure and Formation of Superflash Nonvolatile Memory Cells Influence of Laser Radiation on Functional Properties MOS Device Structures Simulation of Silicon Field-Effect Conical GAA Nanotransistors with a Stacked SiO2/HfO2 Subgate Dielectric Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1