Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov
{"title":"镍杂质对硅太阳能电池工作参数的影响","authors":"Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov","doi":"10.1134/s1063739724600122","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~10<sup>11</sup>–10<sup>13</sup> cm<sup>–3</sup>; and in the near-surface layer, ~10<sup>13</sup>–10<sup>15</sup> cm<sup>–3</sup>. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.</p>","PeriodicalId":21534,"journal":{"name":"Russian Microelectronics","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of Nickel Impurity on the Operating Parameters of a Silicon Solar Cell\",\"authors\":\"Z. T. Kenzhaev, N. F. Zikrillaev, V. B. Odzhaev, K. A. Ismailov, V. S. Prosolovich, Kh. F. Zikrillaev, S. V. Koveshnikov\",\"doi\":\"10.1134/s1063739724600122\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<h3 data-test=\\\"abstract-sub-heading\\\">Abstract</h3><p>The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~10<sup>11</sup>–10<sup>13</sup> cm<sup>–3</sup>; and in the near-surface layer, ~10<sup>13</sup>–10<sup>15</sup> cm<sup>–3</sup>. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.</p>\",\"PeriodicalId\":21534,\"journal\":{\"name\":\"Russian Microelectronics\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-06-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Russian Microelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1134/s1063739724600122\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Russian Microelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1134/s1063739724600122","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
Influence of Nickel Impurity on the Operating Parameters of a Silicon Solar Cell
Abstract
The research results present the influence of nickel impurities introduced by diffusion into monocrystalline silicon on the characteristics of solar cells (SCs). It is established that doping with nickel atoms makes it possible to increase the lifetime of the MCCs in the material by up to a factor of two and the efficiency of SCs by 20–25%. It is shown that the distribution of nickel clusters in the volume of the material is almost uniform, and their size does not exceed 0.5 μm. The concentration of clusters in the volume is ~1011–1013 cm–3; and in the near-surface layer, ~1013–1015 cm–3. The physical mechanisms of the influence of the bulk and near-surface clusters of nickel atoms on the efficiency of silicon SCs are revealed. It is experimentally established that the decisive role in increasing their efficiency is played by the processes of gettering of recombination-active technological impurities by nickel clusters, occurring in the nickel-enriched front surface region of the SCs.
期刊介绍:
Russian Microelectronics covers physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology; dry processing techniques, etching, doping; and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal publishes papers addressing problems of molecular beam epitaxy and related processes; heterojunction devices and integrated circuits; the technology and devices of nanoelectronics; and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, including nanotransistors, and solid state qubits.