An analytical I-V model of SiC double-gate junctionless MOSFETs

Silicon carbide(SiC) double gate junctionless metal oxide semiconductor field-effect transistors(DG JL MOSFETs) have attracted significant attention due to their ideal high temperature characteristics and radiation resistance. Therefore, it is meaningful to exploit an I-V model for SiC DG JL MOSFETs. In this article, we make a linear approximation to describe the relationship between the surface mobile charge density and the surface electron concentration of the device. Based on this approximation and using the one-dimensional Poisson’s equation, we solve for the potential distribution of a SiC DG JL MOSFET in the subthreshold region. From this solution, we derived a functional relationship between the surface mobile charge density in the channel and the channel quasi-Fermi potential. Then we successfully developed a unified I-V model for the SiC DG JL MOSFETs. Based on the drain to source current calculation formula, the calculation expressions for the device’s transconductance and output conductance are derived. By comparing our model with the results from the two-dimensional numerical simulation software Silvaco Atlas, our model’s calculations closely match the two-dimensional numerical simulation results from the subthreshold region to the accumulation region. This model has reference significance for SiC DG JL MOSFETs in the high temperature electronic circuit application field.