Shaikh Parwaiz , Youngku Sohn , Mohammad Mansoob Khan
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Insights into MXenes and MXene-based heterostructures for various photocatalytic applications
Photocatalytic conversion of solar energy into chemical energy is a prospective solution to the energy crisis and environmental challenges. MXenes, characterized by their unique surface features and physicochemical properties derived from their atomically thin layered structures, are becoming promising candidates for various photocatalytic applications. This review offers a concise analysis of the structure and categorization of MAX phases and MXenes. The discussion covers a succinct overview of different synthesis techniques employed in the preparation of MXenes, encompassing traditional HF etching methods, HF-free alternatives, additive-mediated synthesis, and direct synthesis. This study highlights MXenes and related heterostructures as photocatalysts for H2O splitting, CO2 reduction, N2 fixation, H2O2 generation, and pollutant degradation. We incorporated two complementary approaches, in-situ characterization methods, and first-principles calculations, in the following section to provide a better understanding. We conclude this review by offering insights into future directions and a concise summary of the potential applications of MXenes and MXene-based heterostructures in photocatalysis. This review could serve as a valuable reference for the design and fabrication of unique and promising MXene-based photocatalysts.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.