{"title":"TiO2/Cu/TiO2多层膜的透光率及电磁屏蔽性能研究","authors":"Linlin Lu, Zhenghua Yang, Jie Xu, Jie Dong","doi":"10.1007/s10854-024-14199-4","DOIUrl":null,"url":null,"abstract":"<div><p>TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films were prepared on quartz glass by magnetron sputtering, and the effects of Cu film thickness on the electrical, optical and electromagnetic shielding performance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films were investigated. The results show that with the increase of Cu film thickness from 14 to 34 nm, the square resistance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films gradually decreases from 13.1 to 3.29 Ω, and the average visible light transmittance of the multilayer films drops from 80.2% to 66.0%. With the increase of Cu film thicknesses, electromagnetic shielding performance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films exhibits an upward trend. The total electromagnetic shielding effectiveness (<i>SE</i><sub><i>T</i></sub>) of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer film (30/34/30 nm thick) reaches the maximum, and the <i>SE</i><sub><i>T</i></sub> value of the multilayer film exceeds 19 dB.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 2","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-01-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Research on optical transmittance and electromagnetic shielding effectiveness of TiO2/Cu/TiO2 multilayer film\",\"authors\":\"Linlin Lu, Zhenghua Yang, Jie Xu, Jie Dong\",\"doi\":\"10.1007/s10854-024-14199-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films were prepared on quartz glass by magnetron sputtering, and the effects of Cu film thickness on the electrical, optical and electromagnetic shielding performance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films were investigated. The results show that with the increase of Cu film thickness from 14 to 34 nm, the square resistance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films gradually decreases from 13.1 to 3.29 Ω, and the average visible light transmittance of the multilayer films drops from 80.2% to 66.0%. With the increase of Cu film thicknesses, electromagnetic shielding performance of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer films exhibits an upward trend. The total electromagnetic shielding effectiveness (<i>SE</i><sub><i>T</i></sub>) of TiO<sub>2</sub>/Cu/TiO<sub>2</sub> multilayer film (30/34/30 nm thick) reaches the maximum, and the <i>SE</i><sub><i>T</i></sub> value of the multilayer film exceeds 19 dB.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 2\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-01-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-024-14199-4\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-14199-4","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Research on optical transmittance and electromagnetic shielding effectiveness of TiO2/Cu/TiO2 multilayer film
TiO2/Cu/TiO2 multilayer films were prepared on quartz glass by magnetron sputtering, and the effects of Cu film thickness on the electrical, optical and electromagnetic shielding performance of TiO2/Cu/TiO2 multilayer films were investigated. The results show that with the increase of Cu film thickness from 14 to 34 nm, the square resistance of TiO2/Cu/TiO2 multilayer films gradually decreases from 13.1 to 3.29 Ω, and the average visible light transmittance of the multilayer films drops from 80.2% to 66.0%. With the increase of Cu film thicknesses, electromagnetic shielding performance of TiO2/Cu/TiO2 multilayer films exhibits an upward trend. The total electromagnetic shielding effectiveness (SET) of TiO2/Cu/TiO2 multilayer film (30/34/30 nm thick) reaches the maximum, and the SET value of the multilayer film exceeds 19 dB.
期刊介绍：
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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