溅射-蒸发法沉积CuInSe/ sub2 /

A. Rockett, T. Lommasson, L. Yang, H. Talieh, P. Campos, J. Thornton
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引用次数: 8

摘要

介绍了用溅射和蒸发混合技术表征CuInSe/ sub2 /沉积的初步实验结果。在高达450摄氏度的生长温度下,该方法产生的薄膜的成分和结构性能与多晶CuInSe/sub 2/在很大的成分范围内被普遍接受的薄膜相当。薄膜的成分均匀到+或1个原子百分比,而不均匀性可以直接与沉积几何形状有关。在高温下,硒通量对薄膜中硒和铟含量的测定起着重要作用。衬底性质强烈地影响薄膜的组成。在所有温度下,沉积在溅射Mo表面上的层显示出比玻璃膜更低的In含量。在所有生长温度下都观察到Cu、In和Se向Mo衬底柱边界的扩散。
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Deposition of CuInSe/sub 2/ by the hybrid sputtering-and-evaporation method
The initial results of experiments characterizing CuInSe/sub 2/ deposition by a hybrid sputtering-and-evaporation technique are presented. The method yields films with compositions and structural properties comparable with those commonly accepted for polycrystalline CuInSe/sub 2/ over a large composition range at growth temperatures up to 450 degrees C. Film compositions are uniform to within +or-1 atomic percent, and nonuniformities can be directly related to the deposition geometry. The Se flux is shown to play a major role in determining both the Se and the In contents of the films at elevated temperatures. The substrate properties strongly affect the film composition. Layers deposited on sputtered Mo surfaces exhibit a lower In content than films on glass at all temperatures examined. Cu, In, and Se diffusion into the column boundaries of the Mo substrates is observed at all growth temperatures.<>
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