{"title":"ZnO表面欧姆接触研究进展","authors":"Y. Lv, L. Wan","doi":"10.1109/ICEPT.2008.4606940","DOIUrl":null,"url":null,"abstract":"ZnO as an excellent candidate for UV light emitters, varistors, transparent high-power electronics, surface acoustic wave devices, piezoelectric transducers, and chemical and gas sensors could be integrated in a SiP (system-in-package). The SiP could be a critical part in sensor nodes in a sensor network. Normally, the ZnO device in SiP is fabricated with nanoscale films which can be compatible with other materials and processing in a package. However, despite the great potential for electron and photonic applications, ZnO device fabrication is difficult to obtain good ohmic contact. The low resistance and thermal stable ohmic contacts is critical to realize high-performance ZnO-based devices. In this paper, the recent advances of ohmic contacts on ZnO are analyzed and reviewed. The mechanism of the energy band bending at the interface of the semiconductor and the metal is discussed. The factors of forming good quality ZnO films such as the choice of the substrate and the method to deposit ZnO film, the effect of the contact resistance and thermal stability of ohmic contacts are summarized.","PeriodicalId":6324,"journal":{"name":"2008 International Conference on Electronic Packaging Technology & High Density Packaging","volume":"12 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2008-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Recent progress of ohmic contact on ZnO\",\"authors\":\"Y. Lv, L. Wan\",\"doi\":\"10.1109/ICEPT.2008.4606940\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"ZnO as an excellent candidate for UV light emitters, varistors, transparent high-power electronics, surface acoustic wave devices, piezoelectric transducers, and chemical and gas sensors could be integrated in a SiP (system-in-package). The SiP could be a critical part in sensor nodes in a sensor network. Normally, the ZnO device in SiP is fabricated with nanoscale films which can be compatible with other materials and processing in a package. However, despite the great potential for electron and photonic applications, ZnO device fabrication is difficult to obtain good ohmic contact. The low resistance and thermal stable ohmic contacts is critical to realize high-performance ZnO-based devices. In this paper, the recent advances of ohmic contacts on ZnO are analyzed and reviewed. The mechanism of the energy band bending at the interface of the semiconductor and the metal is discussed. The factors of forming good quality ZnO films such as the choice of the substrate and the method to deposit ZnO film, the effect of the contact resistance and thermal stability of ohmic contacts are summarized.\",\"PeriodicalId\":6324,\"journal\":{\"name\":\"2008 International Conference on Electronic Packaging Technology & High Density Packaging\",\"volume\":\"12 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-07-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 International Conference on Electronic Packaging Technology & High Density Packaging\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICEPT.2008.4606940\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Conference on Electronic Packaging Technology & High Density Packaging","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEPT.2008.4606940","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10

摘要

氧化锌作为紫外光发射器、压敏电阻、透明大功率电子器件、表面声波器件、压电换能器、化学和气体传感器的优秀候选者,可以集成在SiP(系统级封装)中。SiP是传感器网络中传感器节点的重要组成部分。通常情况下,SiP中的ZnO器件是由纳米级薄膜制成的,可以与其他材料兼容并在封装中进行加工。然而,尽管在电子和光子应用方面具有巨大的潜力,但ZnO器件的制造很难获得良好的欧姆接触。低电阻和热稳定的欧姆接触是实现高性能zno基器件的关键。本文对近年来氧化锌上欧姆接触的研究进展进行了分析和综述。讨论了半导体与金属界面处能带弯曲的机理。总结了形成高质量ZnO薄膜的因素,如衬底和沉积方法的选择、接触电阻和欧姆触点热稳定性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Recent progress of ohmic contact on ZnO
ZnO as an excellent candidate for UV light emitters, varistors, transparent high-power electronics, surface acoustic wave devices, piezoelectric transducers, and chemical and gas sensors could be integrated in a SiP (system-in-package). The SiP could be a critical part in sensor nodes in a sensor network. Normally, the ZnO device in SiP is fabricated with nanoscale films which can be compatible with other materials and processing in a package. However, despite the great potential for electron and photonic applications, ZnO device fabrication is difficult to obtain good ohmic contact. The low resistance and thermal stable ohmic contacts is critical to realize high-performance ZnO-based devices. In this paper, the recent advances of ohmic contacts on ZnO are analyzed and reviewed. The mechanism of the energy band bending at the interface of the semiconductor and the metal is discussed. The factors of forming good quality ZnO films such as the choice of the substrate and the method to deposit ZnO film, the effect of the contact resistance and thermal stability of ohmic contacts are summarized.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Evaluate anti-shock property of solder bumps by impact test Modeling ion transport through molding compounds and its relation to product reliability The research of the inclusive cache used in multi-core processor The design of the Ku band Dielectric Resonator Oscillator Research on the cascaded inverters based on simplex DC power source
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1