J. Yi, W.S. Kim, S. Song, Y. Khang, H. Kim, J.H. Choi, H. Lim, N. Lee, K. Fujihara, H. Kang, J. Moon, M.Y. Lee
{"title":"可扩展双晶体管存储器(STTM)","authors":"J. Yi, W.S. Kim, S. Song, Y. Khang, H. Kim, J.H. Choi, H. Lim, N. Lee, K. Fujihara, H. Kang, J. Moon, M.Y. Lee","doi":"10.1109/IEDM.2001.979632","DOIUrl":null,"url":null,"abstract":"A novel memory device called Scalable Two-Transistor Memory (STTM) has been developed. STTM is a floating gate device with the writing mechanism of direct tunneling through the multiple tunnel junction (MTJ). STTM has potential advantages of scalability, high density, high speed, long data retention, low voltage operation, low power consumption, and good endurability. We have fabricated and successfully demonstrated the memory cell operation of the STTM for the first time. The STTM unit cell fabricated using 0.16 /spl mu/m silicon processing showed the writing speed of /spl sim/100 ns and the data retention time of /spl sim/200 sec. with the operation voltages of -5/spl sim/5 V. Also, we developed a novel architecture for the high-density STTM cell array with an unit cell size of 4F/sup 2/ and a process scheme to fabricate it.","PeriodicalId":13825,"journal":{"name":"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)","volume":"16 1","pages":"36.1.1-36.1.4"},"PeriodicalIF":0.0000,"publicationDate":"2001-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Scalable Two-Transistor Memory (STTM)\",\"authors\":\"J. Yi, W.S. Kim, S. Song, Y. Khang, H. Kim, J.H. Choi, H. Lim, N. Lee, K. Fujihara, H. Kang, J. Moon, M.Y. Lee\",\"doi\":\"10.1109/IEDM.2001.979632\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A novel memory device called Scalable Two-Transistor Memory (STTM) has been developed. STTM is a floating gate device with the writing mechanism of direct tunneling through the multiple tunnel junction (MTJ). STTM has potential advantages of scalability, high density, high speed, long data retention, low voltage operation, low power consumption, and good endurability. We have fabricated and successfully demonstrated the memory cell operation of the STTM for the first time. The STTM unit cell fabricated using 0.16 /spl mu/m silicon processing showed the writing speed of /spl sim/100 ns and the data retention time of /spl sim/200 sec. with the operation voltages of -5/spl sim/5 V. Also, we developed a novel architecture for the high-density STTM cell array with an unit cell size of 4F/sup 2/ and a process scheme to fabricate it.\",\"PeriodicalId\":13825,\"journal\":{\"name\":\"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)\",\"volume\":\"16 1\",\"pages\":\"36.1.1-36.1.4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-12-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2001.979632\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2001.979632","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A novel memory device called Scalable Two-Transistor Memory (STTM) has been developed. STTM is a floating gate device with the writing mechanism of direct tunneling through the multiple tunnel junction (MTJ). STTM has potential advantages of scalability, high density, high speed, long data retention, low voltage operation, low power consumption, and good endurability. We have fabricated and successfully demonstrated the memory cell operation of the STTM for the first time. The STTM unit cell fabricated using 0.16 /spl mu/m silicon processing showed the writing speed of /spl sim/100 ns and the data retention time of /spl sim/200 sec. with the operation voltages of -5/spl sim/5 V. Also, we developed a novel architecture for the high-density STTM cell array with an unit cell size of 4F/sup 2/ and a process scheme to fabricate it.