一种完全集成的三维序列技术的性能和可靠性

A. Tsiara, X. Garros, L. Brunet, P. Batude, C. Fenouillet-Béranger, K. Triantopoulos, M. Cassé, M. Vinet, F. Gaillard, G. Ghibaudo
{"title":"一种完全集成的三维序列技术的性能和可靠性","authors":"A. Tsiara, X. Garros, L. Brunet, P. Batude, C. Fenouillet-Béranger, K. Triantopoulos, M. Cassé, M. Vinet, F. Gaillard, G. Ghibaudo","doi":"10.1109/VLSIT.2018.8510625","DOIUrl":null,"url":null,"abstract":"We investigate in detail, for the first time, both performance and reliability of a 3D sequential integration process. It is clearly demonstrated that the top level transistor can be successfully processed at 630°C with almost no impact on the performance and reliability of the bottom level. It is also highlighted that top level devices meet the P&NBTI reliability requirements. Finally an example of successful and robust 3D logic integration is proposed based on a 3D inverter combining a top-level PMOS with a bottom-level NMOS.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"89 1","pages":"75-76"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Performance and Reliability of a Fully Integrated 3D Sequential Technology\",\"authors\":\"A. Tsiara, X. Garros, L. Brunet, P. Batude, C. Fenouillet-Béranger, K. Triantopoulos, M. Cassé, M. Vinet, F. Gaillard, G. Ghibaudo\",\"doi\":\"10.1109/VLSIT.2018.8510625\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigate in detail, for the first time, both performance and reliability of a 3D sequential integration process. It is clearly demonstrated that the top level transistor can be successfully processed at 630°C with almost no impact on the performance and reliability of the bottom level. It is also highlighted that top level devices meet the P&NBTI reliability requirements. Finally an example of successful and robust 3D logic integration is proposed based on a 3D inverter combining a top-level PMOS with a bottom-level NMOS.\",\"PeriodicalId\":6561,\"journal\":{\"name\":\"2018 IEEE Symposium on VLSI Technology\",\"volume\":\"89 1\",\"pages\":\"75-76\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE Symposium on VLSI Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2018.8510625\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510625","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

摘要

我们首次详细研究了3D顺序集成过程的性能和可靠性。这清楚地表明,顶层晶体管可以在630°C下成功地加工,而对底层的性能和可靠性几乎没有影响。它还强调,顶级设备满足P&NBTI可靠性要求。最后,提出了一个基于顶层PMOS与底层NMOS相结合的三维逆变器的成功且鲁棒的三维逻辑集成实例。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Performance and Reliability of a Fully Integrated 3D Sequential Technology
We investigate in detail, for the first time, both performance and reliability of a 3D sequential integration process. It is clearly demonstrated that the top level transistor can be successfully processed at 630°C with almost no impact on the performance and reliability of the bottom level. It is also highlighted that top level devices meet the P&NBTI reliability requirements. Finally an example of successful and robust 3D logic integration is proposed based on a 3D inverter combining a top-level PMOS with a bottom-level NMOS.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Low RA Magnetic Tunnel Junction Arrays in Conjunction with Low Switching Current and High Breakdown Voltage for STT-MRAM at 10 nm and Beyond A Circuit Compatible Accurate Compact Model for Ferroelectric-FETs A Threshold Switch Augmented Hybrid-FeFET (H-FeFET) with Enhanced Read Distinguishability and Reduced Programming Voltage for Non-Volatile Memory Applications Sensors and related devices for IoT, medicine and s mart-living A Comprehensive Study of Polymorphic Phase Distribution of Ferroelectric-Dielectrics and Interfacial Layer Effects on Negative Capacitance FETs for Sub-5 nm Node
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1