帽层在控制过孔挤压统计变化中的作用及机理研究

Golareh Jalilvand, Tengfei Jiang
{"title":"帽层在控制过孔挤压统计变化中的作用及机理研究","authors":"Golareh Jalilvand, Tengfei Jiang","doi":"10.1109/ECTC.2019.00294","DOIUrl":null,"url":null,"abstract":"This work examines the effect of a metallic cap layer in controlling via extrusion and explores the underlying mechanisms. Ta was deposited as the cap material, which was very effective in reducing the statistical spread of via extrusion. The correlation between extrusion and microstructure of the vias was investigated and compared for the reference uncoated vias and the Ta-capped vias. Thermo-mechanical characterization as well as TEM characterization of the Ta cap/via interface were also carried out. Void formation at grain junctures were observed. The results suggest that mass transport through grain boundaries plays an important role in causing the statistical variation of extrusion, which can be effectively suppressed by the Ta cap. Void formation was also reduced by the cap layer. Additional factors affecting extrusion, including interfacial diffusion and dislocation glide, were also discussed.","PeriodicalId":6726,"journal":{"name":"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)","volume":"23 1","pages":"1909-1915"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Study of the Effect and Mechanism of a Cap Layer in Controlling the Statistical Variation of Via Extrusion\",\"authors\":\"Golareh Jalilvand, Tengfei Jiang\",\"doi\":\"10.1109/ECTC.2019.00294\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work examines the effect of a metallic cap layer in controlling via extrusion and explores the underlying mechanisms. Ta was deposited as the cap material, which was very effective in reducing the statistical spread of via extrusion. The correlation between extrusion and microstructure of the vias was investigated and compared for the reference uncoated vias and the Ta-capped vias. Thermo-mechanical characterization as well as TEM characterization of the Ta cap/via interface were also carried out. Void formation at grain junctures were observed. The results suggest that mass transport through grain boundaries plays an important role in causing the statistical variation of extrusion, which can be effectively suppressed by the Ta cap. Void formation was also reduced by the cap layer. Additional factors affecting extrusion, including interfacial diffusion and dislocation glide, were also discussed.\",\"PeriodicalId\":6726,\"journal\":{\"name\":\"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)\",\"volume\":\"23 1\",\"pages\":\"1909-1915\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECTC.2019.00294\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2019.00294","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

这项工作考察了金属帽层在通过挤压控制中的作用,并探讨了潜在的机制。沉积Ta作为盖层材料,可以有效地减少通过挤压的统计扩散。研究了未涂覆和Ta-capped两种参考过孔的挤压与微观结构的关系。对Ta cap/via界面进行了热力学表征和TEM表征。在晶粒交界处观察到空洞的形成。结果表明,通过晶界的质量输运是造成挤压统计变化的重要原因,而Ta帽层可以有效地抑制这种变化,帽层也减少了孔隙的形成。讨论了影响挤压的其他因素,包括界面扩散和位错滑动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Study of the Effect and Mechanism of a Cap Layer in Controlling the Statistical Variation of Via Extrusion
This work examines the effect of a metallic cap layer in controlling via extrusion and explores the underlying mechanisms. Ta was deposited as the cap material, which was very effective in reducing the statistical spread of via extrusion. The correlation between extrusion and microstructure of the vias was investigated and compared for the reference uncoated vias and the Ta-capped vias. Thermo-mechanical characterization as well as TEM characterization of the Ta cap/via interface were also carried out. Void formation at grain junctures were observed. The results suggest that mass transport through grain boundaries plays an important role in causing the statistical variation of extrusion, which can be effectively suppressed by the Ta cap. Void formation was also reduced by the cap layer. Additional factors affecting extrusion, including interfacial diffusion and dislocation glide, were also discussed.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Further Enhancement of Thermal Conductivity through Optimal Uses of h-BN Fillers in Polymer-Based Thermal Interface Material for Power Electronics A Novel Design of a Bandwidth Enhanced Dual-Band Impedance Matching Network with Coupled Line Wave Slowing A New Development of Direct Bonding to Aluminum and Nickel Surfaces by Silver Sintering in air Atmosphere Signal Integrity of Submicron InFO Heterogeneous Integration for High Performance Computing Applications Multilayer Glass Substrate with High Density Via Structure for All Inorganic Multi-chip Module
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1