R. Nebashi, N. Banno, M. Miyamura, Y. Tsuji, A. Morioka, X. Bai, K. Okamoto, N. Iguchi, H. Numata, H. Hada, T. Sugibayashi, T. Sakamoto, M. Tada
{"title":"面向28nm节点非易失性可编程逻辑的高密度容错铜原子开关技术","authors":"R. Nebashi, N. Banno, M. Miyamura, Y. Tsuji, A. Morioka, X. Bai, K. Okamoto, N. Iguchi, H. Numata, H. Hada, T. Sugibayashi, T. Sakamoto, M. Tada","doi":"10.1109/VLSIT.2018.8510703","DOIUrl":null,"url":null,"abstract":"Key device/circuit technologies for realizing a 28nm-node atom switch programmable logic (AS-PL) have been developed. An advanced polymer solid-electrolyte (PSE) reduces set voltage down to 1.6 V while ensuring ON-state and OFF-state reliabilities under current and voltage stress at 125°C. A fine-grain redundancy in a cross-bar array also contributes to reduce supply voltage by 6%. A routing-based wear leveling improves programming cycles by nine times. The developed technologies allow us to design the 28nm-node AS-PL with a 32% higher performance and 11% lower power.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"38 1","pages":"127-128"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High-Density and Fault-Tolerant Cu Atom Switch Technology Toward 28nm-node Nonvolatile Programmable Logic\",\"authors\":\"R. Nebashi, N. Banno, M. Miyamura, Y. Tsuji, A. Morioka, X. Bai, K. Okamoto, N. Iguchi, H. Numata, H. Hada, T. Sugibayashi, T. Sakamoto, M. Tada\",\"doi\":\"10.1109/VLSIT.2018.8510703\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Key device/circuit technologies for realizing a 28nm-node atom switch programmable logic (AS-PL) have been developed. An advanced polymer solid-electrolyte (PSE) reduces set voltage down to 1.6 V while ensuring ON-state and OFF-state reliabilities under current and voltage stress at 125°C. A fine-grain redundancy in a cross-bar array also contributes to reduce supply voltage by 6%. A routing-based wear leveling improves programming cycles by nine times. The developed technologies allow us to design the 28nm-node AS-PL with a 32% higher performance and 11% lower power.\",\"PeriodicalId\":6561,\"journal\":{\"name\":\"2018 IEEE Symposium on VLSI Technology\",\"volume\":\"38 1\",\"pages\":\"127-128\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE Symposium on VLSI Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2018.8510703\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510703","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High-Density and Fault-Tolerant Cu Atom Switch Technology Toward 28nm-node Nonvolatile Programmable Logic
Key device/circuit technologies for realizing a 28nm-node atom switch programmable logic (AS-PL) have been developed. An advanced polymer solid-electrolyte (PSE) reduces set voltage down to 1.6 V while ensuring ON-state and OFF-state reliabilities under current and voltage stress at 125°C. A fine-grain redundancy in a cross-bar array also contributes to reduce supply voltage by 6%. A routing-based wear leveling improves programming cycles by nine times. The developed technologies allow us to design the 28nm-node AS-PL with a 32% higher performance and 11% lower power.