A Circuit Compatible Accurate Compact Model for Ferroelectric-FETs

In this work we develop a compact model of ferroelectric field-effect-transistors (FeFET) for memory applications, enabling their exploration at the circuit and architecture level. In contrast to Landau-Khalatnikov (L-K) based approaches, the presented model is founded on the combination of a nucleation dominated multi-domain Presiach theory of ferroelectric switching with a conventional transistor model. The model successfully reproduces the evolution of the FeFET memory window as a function of the program and erase conditions (amplitude, pulse width, and history). To calibrate the model, we fabricated 10nm thick Hf0.4Zr0.6O2 (HZO) MFM capacitors and FeFETs and characterized the polarization switching dynamics. Our results highlight the importance of accounting for the switching history, minor loop trajectory, and coupled time-voltage response of the ferroelectric to quantitatively reproduce the measured FeFET characteristics.