SiGe中的悬垂键态:H,F由温度相关的mu tau测量

D. Shen, J. Conde, V. Chu, J.Z. Liu, A. Maruyama, S. Aljishi, Z. Smith, S. Wagner
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引用次数: 0

摘要

作者报告了一种测量太阳能电池用a- si:H和a- sige:H,F合金光浸泡前后D/sup 0/-/态密度分布的新技术。电子飞行时间(TOF)测量作为温度的函数构成了该技术的基础。电子的深度捕获控制了迁移寿命积(mu tau)/sub n/,这是由集成TOF电流计算的。主要的深陷阱是D/sup 0/-/水平。作者确定了a:SiGe:H,F中D/sup 0/-/态的密度,峰值在SiE/sub c/-(0.40 ~ 0.45) eV,最大值在10/sup 18/ ~ 10/sup 19/-cm/sup -3/ eV/sup -1/范围内。在a-Si:H中,峰值位于E/sub c/-0.45 eV;随着光浸泡时间的延长,其生长也随之增加。
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Dangling-bond states in a SiGe:H,F measured by temperature-dependent mu tau
The authors report a novel technique for measuring the density distribution of the D/sup 0/-/ state in a-Si:H before and after light soaking and in a-SiGe:H,F alloys for solar cells. Electron time-of-flight (TOF) measurements as a function of temperature form the basis of this technique. The deep trapping of electrons controls the mobility-lifetime product ( mu tau )/sub n/, which is evaluated from the integrated TOF current. The dominant deep trap is the D/sup 0/-/ level. The authors determine the density of D/sup 0/-/ states in a:SiGe:H,F that peak at SiE/sub c/-(0.40 to 0.45) eV with maxima in the 10/sup 18/ to 10/sup 19/-cm/sup -3/ eV/sup -1/ range. In a-Si:H, the peak lies at E/sub c/-0.45 eV; it is observed to grow with increasing light-soaking time.<>
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