GaInP/GaAs HBTs for microwave applications

S. Delage, M. di Forte-Poisson, D. Pons
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Abstract

The authors present an overview of the current status of the development of the GaInP/GaAs heterojunction bipolar transistor (HBT) technology. One of the most important advantages of using GaInP instead of GaAlAs is technological. Each of the GaInP and GaAs layers can be etched selectively with respect to the other. It is shown that GaInP/GaAs HBTs have identical or superior device performance to GaAlAs/GaAs HBTs and that the etching selectivity facilitates greatly the device fabrication and allows excellent device performance uniformity and reproducibility.<>
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微波应用的GaInP/GaAs HBTs
综述了GaInP/GaAs异质结双极晶体管(HBT)技术的发展现状。使用GaInP代替GaAlAs最重要的优点之一是技术上的。每个GaInP层和GaAs层都可以选择性地相对于其他层蚀刻。结果表明,GaInP/GaAs HBTs具有与GaAlAs/GaAs HBTs相同或更好的器件性能,并且蚀刻选择性极大地促进了器件制造,并允许优异的器件性能均匀性和再现性。
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Normal incidence intersubband absorption in InGaAs quantum wells Interdiffusion of InGaAs/InGaAsP quantum wells GaInP/GaAs HBTs for microwave applications First fabrication of continuously graded InGaAsP on GaAs for 0.98/spl mu/m lasers Improved breakdown-speed tradeoff of InP/InGaAs single heterojunction bipolar transistor using a novel p/sup -/-n/sup -/ collector structure
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