Jian-Hsing Lee, J. Shih, Chin-Hsin Tang, Pao-Kang Niu, D. Perng, Y.-T. Lin, D. Su, Kenneth Wu
{"title":"The mechanism of device damage during bump process for flip-chip package","authors":"Jian-Hsing Lee, J. Shih, Chin-Hsin Tang, Pao-Kang Niu, D. Perng, Y.-T. Lin, D. Su, Kenneth Wu","doi":"10.1109/IRPS.2009.5173328","DOIUrl":null,"url":null,"abstract":"Ring-type yield loss at wafer edge has been observed during flip-chip packaging process. The failure mechanism is attributed to the scrubber clean process step which generates a lot of charges. This in turn behaves like an electrostatic discharge (ESD) event and damages gate oxide of internal circuits. An equivalent circuit is proposed to analyze such a kind of ESD event and proves the importance of the parasitic capacitance of the interconnect metal.","PeriodicalId":345860,"journal":{"name":"2009 IEEE International Reliability Physics Symposium","volume":"4 4","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2009.5173328","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Ring-type yield loss at wafer edge has been observed during flip-chip packaging process. The failure mechanism is attributed to the scrubber clean process step which generates a lot of charges. This in turn behaves like an electrostatic discharge (ESD) event and damages gate oxide of internal circuits. An equivalent circuit is proposed to analyze such a kind of ESD event and proves the importance of the parasitic capacitance of the interconnect metal.