Novel Charge Trap Devices with NCBO Trap Layers for NVM or Image Sensor

K. Joo, Changrok Moon, Sungnam Lee, Xiofeng Wang, J. Yang, I. Yeo, Duckhyung Lee, O. Nam, U. Chung, J. Moon, B. Ryu
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引用次数: 20

Abstract

ZnO or AlxGa1-xN charge trap device showed large memory window (>7V) with fast P/E speed (plusmn17 V, 100 (_is) and excellent retention (10-year memory window of 6 V with small charge loss rate; ~l/5 of that of Si3N4). GaN and ZnO trap devices also showed the photo-sensitive programming due to their optoelectronics properties, providing the possibility of developing new type of high performance image sensor (QE ~ 80%)
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用于NVM或图像传感器的新型NCBO陷阱层电荷陷阱器件
ZnO或AlxGa1-xN电荷阱器件具有大的记忆窗口(bbb7v)和快的P/E速度(plusmn17 V, 100 (_is))和良好的保留(10年记忆窗口为6 V,电荷损失率小);~ Si3N4的1 /5)。GaN和ZnO阱器件由于其光电子特性也表现出光敏编程,为开发新型高性能图像传感器(QE ~ 80%)提供了可能。
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