K. Rook, A. Kulkarni, A. Checco, Kenji Yamamoto, Russell Luberoff, Mario Roque, Stephen Lozowski, Joel A. Bahena, Marjorie Chee, Meng H. Lee
{"title":"Advancements in Mo/Si deposition techniques for high volume manufacturing of EUV mask blanks","authors":"K. Rook, A. Kulkarni, A. Checco, Kenji Yamamoto, Russell Luberoff, Mario Roque, Stephen Lozowski, Joel A. Bahena, Marjorie Chee, Meng H. Lee","doi":"10.1117/12.2641798","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"72 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2641798","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}