S. Nagahara, Arnaud Dauendorffer, Xiang Liu, T. Onitsuka, H. Genjima, Noriaki Nagamine, Yuhei Kuwahara, Y. Kamei, S. Kawakami, M. Muramatsu, S. Shimura, K. Nafus, N. Oikawa, Y. Feurprier, M. Demand, S. Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, E. Liu, C. Catano, J. LaRose, Jeffrery C. Shearer, L. Huli, P. Foubert, D. De Simone
{"title":"Holistic litho-etch development to address patterning challenges towards high NA EUV","authors":"S. Nagahara, Arnaud Dauendorffer, Xiang Liu, T. Onitsuka, H. Genjima, Noriaki Nagamine, Yuhei Kuwahara, Y. Kamei, S. Kawakami, M. Muramatsu, S. Shimura, K. Nafus, N. Oikawa, Y. Feurprier, M. Demand, S. Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, E. Liu, C. Catano, J. LaRose, Jeffrery C. Shearer, L. Huli, P. Foubert, D. De Simone","doi":"10.1117/12.2642941","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2642941","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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