W. Eschen, L. Loetgering, V. Schuster, R. Klas, A. Kirsche, L. Berthold, M. Steinert, T. Pertsch, M. Krause, J. Limpert, J. Rothhardt
{"title":"Material-specific high-resolution extreme ultraviolet microscopy using a high-order harmonic source","authors":"W. Eschen, L. Loetgering, V. Schuster, R. Klas, A. Kirsche, L. Berthold, M. Steinert, T. Pertsch, M. Krause, J. Limpert, J. Rothhardt","doi":"10.1117/12.2641705","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2641705","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}