T. Allenet, M. Vockenhuber, L. van Lent-Protasova, Y. Ekinci, D. Kazazis
{"title":"On EUV resist screening with interference lithography in H1-2022","authors":"T. Allenet, M. Vockenhuber, L. van Lent-Protasova, Y. Ekinci, D. Kazazis","doi":"10.1117/12.2641837","DOIUrl":"https://doi.org/10.1117/12.2641837","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132044924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Bhattacharyya, Rudy Peters, G. Storms, Diederik de Bruin, J. Santaclara, Rob van Ballegoij, E. van Setten, Teun van Gogh
{"title":"Evolutionary step in EUV technology with high NA","authors":"K. Bhattacharyya, Rudy Peters, G. Storms, Diederik de Bruin, J. Santaclara, Rob van Ballegoij, E. van Setten, Teun van Gogh","doi":"10.1117/12.2644966","DOIUrl":"https://doi.org/10.1117/12.2644966","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132758374","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, Jinho Ahn
{"title":"Investigation of ZrSi2 for application to EUV pellicle","authors":"S. Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, Jinho Ahn","doi":"10.1117/12.2641822","DOIUrl":"https://doi.org/10.1117/12.2641822","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125001340","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Donggi Lee, Young Woong Kim, Seungchan Moon, Jinhyuk Choi, S. Wi, Jinho Ahn
{"title":"Experimental demonstration for the influence of EUV pellicle wrinkles on the mask 3D effects","authors":"Donggi Lee, Young Woong Kim, Seungchan Moon, Jinhyuk Choi, S. Wi, Jinho Ahn","doi":"10.1117/12.2641801","DOIUrl":"https://doi.org/10.1117/12.2641801","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130652487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Eller, Jander Cruz, S. Verkhoturov, M. A. Robinson, J. Blackwell, E. Schweikert
{"title":"Evaluating the role of photoacid generator and quencher loadings on EUV film homogeneity","authors":"M. Eller, Jander Cruz, S. Verkhoturov, M. A. Robinson, J. Blackwell, E. Schweikert","doi":"10.1117/12.2641539","DOIUrl":"https://doi.org/10.1117/12.2641539","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133893009","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Defect risks in chemically amplified resists used for extreme ultraviolet lithography","authors":"T. Kozawa","doi":"10.1117/12.2643012","DOIUrl":"https://doi.org/10.1117/12.2643012","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131703207","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. Behnke, Y. Mostafa, Z. Bouza, A. Lassise, L. Poirier, J. Sheil, W. Ubachs, O. Versolato
{"title":"Two-micrometer-wavelength laser-produced tin plasma EUV sources","authors":"L. Behnke, Y. Mostafa, Z. Bouza, A. Lassise, L. Poirier, J. Sheil, W. Ubachs, O. Versolato","doi":"10.1117/12.2642234","DOIUrl":"https://doi.org/10.1117/12.2642234","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128219084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
W. Eschen, L. Loetgering, V. Schuster, R. Klas, A. Kirsche, L. Berthold, M. Steinert, T. Pertsch, M. Krause, J. Limpert, J. Rothhardt
{"title":"Material-specific high-resolution extreme ultraviolet microscopy using a high-order harmonic source","authors":"W. Eschen, L. Loetgering, V. Schuster, R. Klas, A. Kirsche, L. Berthold, M. Steinert, T. Pertsch, M. Krause, J. Limpert, J. Rothhardt","doi":"10.1117/12.2641705","DOIUrl":"https://doi.org/10.1117/12.2641705","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115269929","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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