K. Bhattacharyya, Rudy Peters, G. Storms, Diederik de Bruin, J. Santaclara, Rob van Ballegoij, E. van Setten, Teun van Gogh
{"title":"Evolutionary step in EUV technology with high NA","authors":"K. Bhattacharyya, Rudy Peters, G. Storms, Diederik de Bruin, J. Santaclara, Rob van Ballegoij, E. van Setten, Teun van Gogh","doi":"10.1117/12.2644966","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2644966","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
