Thermodynamic Model of Moving Vacuum Arcs on Contrate Contacts

D. Branston, W. Haas, W. Hartmann, R. Renz, N. Wenzel
{"title":"Thermodynamic Model of Moving Vacuum Arcs on Contrate Contacts","authors":"D. Branston, W. Haas, W. Hartmann, R. Renz, N. Wenzel","doi":"10.1109/DEIV.2006.357285","DOIUrl":null,"url":null,"abstract":"The behavior of constricted vacuum arcs on radial magnetic field (RMF) contacts in vacuum tubes of medium voltage circuit breakers strongly determines the breaking capacity of these contact systems. The movement of these arcs under the influence of the RMF is investigated with the help of a one-dimensional (1D) thermodynamic model of the arc and its interaction with the contact surface. Heat conduction and evaporation are taken care of analytically, while the size of the arc root and, hence, its current density has been determined experimentally. The energy balance is solved by using empirical values for the respective sheath voltage drops. It is complemented by a momentum balance incorporating neutral vapor loss from the arc boundaries, which is found to be essential for the quantitative understanding of the arc physics. A time-dependent analysis of the arc properties like the arc velocity during a sine half-wave produces a good agreement with experimental values measured for different sizes of contrate contacts. The model is explained and compared to experimental results of arc velocity and experimentally determined switching capacity, respectively","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"77 6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2006.357285","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

Abstract

The behavior of constricted vacuum arcs on radial magnetic field (RMF) contacts in vacuum tubes of medium voltage circuit breakers strongly determines the breaking capacity of these contact systems. The movement of these arcs under the influence of the RMF is investigated with the help of a one-dimensional (1D) thermodynamic model of the arc and its interaction with the contact surface. Heat conduction and evaporation are taken care of analytically, while the size of the arc root and, hence, its current density has been determined experimentally. The energy balance is solved by using empirical values for the respective sheath voltage drops. It is complemented by a momentum balance incorporating neutral vapor loss from the arc boundaries, which is found to be essential for the quantitative understanding of the arc physics. A time-dependent analysis of the arc properties like the arc velocity during a sine half-wave produces a good agreement with experimental values measured for different sizes of contrate contacts. The model is explained and compared to experimental results of arc velocity and experimentally determined switching capacity, respectively
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
真空弧在接触面上运动的热力学模型
中压断路器真空管中径向磁场触点的收缩真空电弧行为对触点系统的分断能力有很大的决定作用。借助电弧的一维热力学模型及其与接触面的相互作用,研究了这些电弧在RMF影响下的运动。热传导和蒸发是用解析法计算的,而电弧根的大小和电流密度是用实验法确定的。能量平衡通过使用各自护套电压降的经验值来解决。它是一个动量平衡的补充,包括电弧边界的中性蒸汽损失,这被认为是定量理解电弧物理的必要条件。对正弦半波期间的电弧速度等电弧特性进行的时间相关分析与不同尺寸的contate触点测量的实验值非常吻合。对模型进行了解释,并与电弧速度和开关容量的实验结果进行了比较
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Plasma CVD for Producing Si Quantum Dot Films Determination of Plasma Current on the Electrode Biased a High Negative Potential Interaction of a Vacuum Arc with an SF6 Arc in a Hybrid Circuit Breaker during High-Current Interruption Improvement on the Property of TiO2 Films due to Plasma Processing Investigation of Plasma Recovery during Fall Time in Plasma Source Ion Implantation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1