Pub Date : 2006-12-01DOI: 10.1109/DEIV.2006.357358
H. Hwang, Jae-Myeong Choe, Kyung-Jae Jung, Kwang-Chul Ko, Y. Hwang, Gon-Ho Kim
In the case of highly negative biased target immersed in the plasma, the current on the target is composed of the incident ion current and the emission electron current. The virtual area of collecting current on the target is proportional to the sheath area formed over the target electrode which is considerable increased with applied high bias. The spatially distributed plasma also affects on the sheath formation, resulting in the target current. Consideration of the dimensional sheath formation and spatial plasma distribution with the secondary electron emission coefficient is conducted for analyzing the target current. Experiments were carried out with the planar stainless steel and aluminum targets having a diameter 100mm, negatively bias ranging in 2kV~11kV. Sheath size and spatial plasma distributions are measured by electrical probes. The current model including the dimensional sheath, spatial plasma distribution and secondary electron emission coefficient will be presented
{"title":"Determination of Plasma Current on the Electrode Biased a High Negative Potential","authors":"H. Hwang, Jae-Myeong Choe, Kyung-Jae Jung, Kwang-Chul Ko, Y. Hwang, Gon-Ho Kim","doi":"10.1109/DEIV.2006.357358","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357358","url":null,"abstract":"In the case of highly negative biased target immersed in the plasma, the current on the target is composed of the incident ion current and the emission electron current. The virtual area of collecting current on the target is proportional to the sheath area formed over the target electrode which is considerable increased with applied high bias. The spatially distributed plasma also affects on the sheath formation, resulting in the target current. Consideration of the dimensional sheath formation and spatial plasma distribution with the secondary electron emission coefficient is conducted for analyzing the target current. Experiments were carried out with the planar stainless steel and aluminum targets having a diameter 100mm, negatively bias ranging in 2kV~11kV. Sheath size and spatial plasma distributions are measured by electrical probes. The current model including the dimensional sheath, spatial plasma distribution and secondary electron emission coefficient will be presented","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128709922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-12-01DOI: 10.1109/DEIV.2006.357362
S. Iwashita, H. Miyahara, K. Koga, M. Shiratani, S. Nunomura, M. Kondo
Si quantum dot films are deposited using a multi-hollow discharge plasma CVD method. For the method, Si nano-crystallites of a small size dispersion and radicals are produced using H2+SiH4 VHF discharges, and then they are co-deposited on to a substrate to form Si quantum dot films, that is, a-Si:H films containing nano-crystallites. The films have a wide optical band gap of 1.8 eV and a large optical absorption coefficient similar to those of a-Si:H films. They also have a low initial defect density below 1 times 1016 cm-3 and show high stability against light soaking. These results suggest that the Si quantum dot films are promising materials for solar cells
{"title":"Plasma CVD for Producing Si Quantum Dot Films","authors":"S. Iwashita, H. Miyahara, K. Koga, M. Shiratani, S. Nunomura, M. Kondo","doi":"10.1109/DEIV.2006.357362","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357362","url":null,"abstract":"Si quantum dot films are deposited using a multi-hollow discharge plasma CVD method. For the method, Si nano-crystallites of a small size dispersion and radicals are produced using H2+SiH4 VHF discharges, and then they are co-deposited on to a substrate to form Si quantum dot films, that is, a-Si:H films containing nano-crystallites. The films have a wide optical band gap of 1.8 eV and a large optical absorption coefficient similar to those of a-Si:H films. They also have a low initial defect density below 1 times 1016 cm-3 and show high stability against light soaking. These results suggest that the Si quantum dot films are promising materials for solar cells","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126321977","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357388
T. Yanagidaira, S. Kawahara, K. Tsuruta
Temporal lowering of gas pressure and density after expansion of pulsed arc was utilized for acceleration of ions in a micro plasma. The device consists of three electrodes: two axial electrodes for producing arc plasma, and an electrode in the radial direction for accelerating ions. A shockwave is driven by expanding plasma, and surrounding air is swept out of the volume between electrodes. An ion sheath was formed around electrodes and accelerating voltage (voltage across ion sheath) of several hundred volts was obtained
{"title":"Ion Electrostatic Acceleration in a Pulsed Micro Plasma","authors":"T. Yanagidaira, S. Kawahara, K. Tsuruta","doi":"10.1109/DEIV.2006.357388","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357388","url":null,"abstract":"Temporal lowering of gas pressure and density after expansion of pulsed arc was utilized for acceleration of ions in a micro plasma. The device consists of three electrodes: two axial electrodes for producing arc plasma, and an electrode in the radial direction for accelerating ions. A shockwave is driven by expanding plasma, and surrounding air is swept out of the volume between electrodes. An ion sheath was formed around electrodes and accelerating voltage (voltage across ion sheath) of several hundred volts was obtained","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116892543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357285
D. Branston, W. Haas, W. Hartmann, R. Renz, N. Wenzel
The behavior of constricted vacuum arcs on radial magnetic field (RMF) contacts in vacuum tubes of medium voltage circuit breakers strongly determines the breaking capacity of these contact systems. The movement of these arcs under the influence of the RMF is investigated with the help of a one-dimensional (1D) thermodynamic model of the arc and its interaction with the contact surface. Heat conduction and evaporation are taken care of analytically, while the size of the arc root and, hence, its current density has been determined experimentally. The energy balance is solved by using empirical values for the respective sheath voltage drops. It is complemented by a momentum balance incorporating neutral vapor loss from the arc boundaries, which is found to be essential for the quantitative understanding of the arc physics. A time-dependent analysis of the arc properties like the arc velocity during a sine half-wave produces a good agreement with experimental values measured for different sizes of contrate contacts. The model is explained and compared to experimental results of arc velocity and experimentally determined switching capacity, respectively
{"title":"Thermodynamic Model of Moving Vacuum Arcs on Contrate Contacts","authors":"D. Branston, W. Haas, W. Hartmann, R. Renz, N. Wenzel","doi":"10.1109/DEIV.2006.357285","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357285","url":null,"abstract":"The behavior of constricted vacuum arcs on radial magnetic field (RMF) contacts in vacuum tubes of medium voltage circuit breakers strongly determines the breaking capacity of these contact systems. The movement of these arcs under the influence of the RMF is investigated with the help of a one-dimensional (1D) thermodynamic model of the arc and its interaction with the contact surface. Heat conduction and evaporation are taken care of analytically, while the size of the arc root and, hence, its current density has been determined experimentally. The energy balance is solved by using empirical values for the respective sheath voltage drops. It is complemented by a momentum balance incorporating neutral vapor loss from the arc boundaries, which is found to be essential for the quantitative understanding of the arc physics. A time-dependent analysis of the arc properties like the arc velocity during a sine half-wave produces a good agreement with experimental values measured for different sizes of contrate contacts. The model is explained and compared to experimental results of arc velocity and experimentally determined switching capacity, respectively","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"77 6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121031375","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357369
T. Masaki, M. Arai, T. Iwao, M. Yumoto
Poly methyl methacrylate (PMMA) has some excellent optical properties among polymer materials, such as low refraction. Accordingly, PMMA is utilized widely such as lens and optical fiber in optical category. But because of its low surface hardness, the surface is easily damaged, and the transparency decreases with time. Therefore, if the surface hardness of PMMA can be improved, it is expected that the industrial value of PMMA rises. So the authors irradiated low energy nitrogen ion on PMMA and measured the surface hardness using nanoindentation method. As experimental method, nitrogen ions which were generated by RF (radio frequency) plasma in nitrogen ambient atmosphere of about 10-2 Pa were accelerated to about 100-1000 eV by accelerating electrode and were irradiated on PMMA. As a result, the surface hardness changes depending on the accelerating voltage. The paper will be summarized the experimental procedure and the result
{"title":"Dependence of Accelerating Voltage on Surface Hardness of PMMA by Low Energy Nitrogen Ion Irradiation","authors":"T. Masaki, M. Arai, T. Iwao, M. Yumoto","doi":"10.1109/DEIV.2006.357369","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357369","url":null,"abstract":"Poly methyl methacrylate (PMMA) has some excellent optical properties among polymer materials, such as low refraction. Accordingly, PMMA is utilized widely such as lens and optical fiber in optical category. But because of its low surface hardness, the surface is easily damaged, and the transparency decreases with time. Therefore, if the surface hardness of PMMA can be improved, it is expected that the industrial value of PMMA rises. So the authors irradiated low energy nitrogen ion on PMMA and measured the surface hardness using nanoindentation method. As experimental method, nitrogen ions which were generated by RF (radio frequency) plasma in nitrogen ambient atmosphere of about 10-2 Pa were accelerated to about 100-1000 eV by accelerating electrode and were irradiated on PMMA. As a result, the surface hardness changes depending on the accelerating voltage. The paper will be summarized the experimental procedure and the result","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127214906","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357389
Y. Sakai, T. Komatsu, Yifan Xiao, I. Song, M. Watanabe, A. Okino, E. Hotta
Characteristics of soft X-ray radiation from nitrogen Z-pinch plasma column energized by a capillary discharge is reported as a fundamental study for H-like N recombination pumped soft X-ray laser, wavelength of which is 13.4 nm emitted by quantum transition from n = 3 to n = 2. A current pulse of about 15 kA with half-cycle duration of about 110 ns was utilized to excite nitrogen plasma in a 3.0 mm diameter channel. From spectroscopic measurement using a transmission grating spectrometer, ionic charge state of nitrogen in the plasma was analyzed to estimate plasma parameters and the discharge current required for realizing a H-like N recombination soft X-ray laser
{"title":"Soft X-ray radiation from nitrogen filled capillary z-pinch plasma","authors":"Y. Sakai, T. Komatsu, Yifan Xiao, I. Song, M. Watanabe, A. Okino, E. Hotta","doi":"10.1109/DEIV.2006.357389","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357389","url":null,"abstract":"Characteristics of soft X-ray radiation from nitrogen Z-pinch plasma column energized by a capillary discharge is reported as a fundamental study for H-like N recombination pumped soft X-ray laser, wavelength of which is 13.4 nm emitted by quantum transition from n = 3 to n = 2. A current pulse of about 15 kA with half-cycle duration of about 110 ns was utilized to excite nitrogen plasma in a 3.0 mm diameter channel. From spectroscopic measurement using a transmission grating spectrometer, ionic charge state of nitrogen in the plasma was analyzed to estimate plasma parameters and the discharge current required for realizing a H-like N recombination soft X-ray laser","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126119238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357442
M. Nakamoto
Vacuum nanoelectronics has been expected to provide a number of advanced devices such as flat panel displays, high-frequency devices and so on. Especially, field emission displays (FEDs) including surface-conduction electron-emitter displays (SEDs) have been showing tremendous progress and become attractive nanoelectronic technology for a new generation of flat panel displays. However, there are important limitations of their reliability and efficiency in FEDs and SEDs, mainly attributed to the emitters. The transfer mold emitters, the carbon nanotube emitters and the surface conduction electron emitters (SCEs) have been the candidates for getting and controlling the emitter structures. In this paper, the recent progress and the technical issues on FEDs and SEDs are overviewed
{"title":"Advances in Field Emission Displays","authors":"M. Nakamoto","doi":"10.1109/DEIV.2006.357442","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357442","url":null,"abstract":"Vacuum nanoelectronics has been expected to provide a number of advanced devices such as flat panel displays, high-frequency devices and so on. Especially, field emission displays (FEDs) including surface-conduction electron-emitter displays (SEDs) have been showing tremendous progress and become attractive nanoelectronic technology for a new generation of flat panel displays. However, there are important limitations of their reliability and efficiency in FEDs and SEDs, mainly attributed to the emitters. The transfer mold emitters, the carbon nanotube emitters and the surface conduction electron emitters (SCEs) have been the candidates for getting and controlling the emitter structures. In this paper, the recent progress and the technical issues on FEDs and SEDs are overviewed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115526240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357272
R. Smeets, V. Kertész, D. Dufournet, D. Penache, M. Schlaug
A hybrid circuit breaker consists of a series connected vacuum- and SF6 interrupter. The vacuum interrupter has the function to withstand very steep rising transient recovery voltages, whereas the SF6 interrupter is stressed with the peak of this voltage. Full scale tests are described of a 145 kV prototype, subjected to short-line faults based on 63 kA. During these tests, current through the breaker and voltages across both interrupters were monitored with a high-resolution measurement system. It is shown that the principal idea works correctly. From measured results, it is demonstrated that the interaction between the two arcs of completely different physical nature has a positive effect on the interruption: immediately before current zero the SF6 arc assists the vacuum arc to interrupt, whereas after current zero the vacuum arc assists the SF6 arc in the withstand of the recovery voltage
{"title":"Interaction of a Vacuum Arc with an SF6 Arc in a Hybrid Circuit Breaker during High-Current Interruption","authors":"R. Smeets, V. Kertész, D. Dufournet, D. Penache, M. Schlaug","doi":"10.1109/DEIV.2006.357272","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357272","url":null,"abstract":"A hybrid circuit breaker consists of a series connected vacuum- and SF6 interrupter. The vacuum interrupter has the function to withstand very steep rising transient recovery voltages, whereas the SF6 interrupter is stressed with the peak of this voltage. Full scale tests are described of a 145 kV prototype, subjected to short-line faults based on 63 kA. During these tests, current through the breaker and voltages across both interrupters were monitored with a high-resolution measurement system. It is shown that the principal idea works correctly. From measured results, it is demonstrated that the interaction between the two arcs of completely different physical nature has a positive effect on the interruption: immediately before current zero the SF6 arc assists the vacuum arc to interrupt, whereas after current zero the vacuum arc assists the SF6 arc in the withstand of the recovery voltage","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"5 11-12","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114035233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357231
D. Shmelev, S. Barengolts
A new mechanism of the anomalous acceleration of ions at the spark stage of a vacuum discharge is proposed. It has been shown that this acceleration can take place in the presence of a plasma cloud in the electrode gap with strong electronic instability developing in this plasma
{"title":"On the Mechanism of the Anomalous Acceleration of Ions in Vacuum and Plasma Diodes","authors":"D. Shmelev, S. Barengolts","doi":"10.1109/DEIV.2006.357231","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357231","url":null,"abstract":"A new mechanism of the anomalous acceleration of ions at the spark stage of a vacuum discharge is proposed. It has been shown that this acceleration can take place in the presence of a plasma cloud in the electrode gap with strong electronic instability developing in this plasma","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128723943","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357395
M. Watanabe, H. Taniuchi, H. Motomura, M. Jinno
In these days, the damage of hot springs quality by bacilli is getting serious problem. The bacilli can be killed out by heating, chlorination or ultraviolet rays irradiation in general. However, some of bacilli have the tolerance in heat and chlorine, on the other hand they do not have the tolerance in ultraviolet rays. Therefore, most bacilli can be killed out by using ultraviolet rays (Yoshino, 2004). The wavelength of effective ultraviolet rays for sterilization is in the vicinity of 250 nm. Mercury has a spectrum with strong resonance wavelength 253.7 nm. Therefore, mercury is used for the ultraviolet source. However, there are strong needs to reduce harmful mercury, because mercury can cause environmental problems. Then, the authors have paid attention to XeI emitting the radiation of 253 nm, which is near resonance radiation (253.7 nm) of mercury. In this study, the authors investigated the characteristics of the ultraviolet-rays light source that used XeI. Dielectric barrier discharge (DBD) is used as a lighting method. Parameter of xenon filling pressure was 39.9 Pa or 1.33 kPa. The vapor pressure of the iodine in the discharge tube was assumed to be 46.6 Pa from the temperature of the discharge tube wall. Two aluminum tapes (60 mm long and 20 mm wide) have been set in the opposite position of the outer wall of a discharge tube to each other as external electrodes. And the sinusoidal wave voltage or the pulsed negative voltage was impressed to the external electrode. By the dielectric barrier discharge, XeI excimers were generated and radiation around 253 nm from XeI was obtained. Consequently, when the partial pressure of the xenon was low, the continuous spectrum (peak wavelength 342 nm) from the iodine molecule was strongly radiated. However, when the partial pressure of the xenon was high, the continuous spectrum (peak wavelength 253 nm) from XeI was strongly radiated
{"title":"VUV emission by XeI excimer in Low-Pressure Xenon-Iodine mixture","authors":"M. Watanabe, H. Taniuchi, H. Motomura, M. Jinno","doi":"10.1109/DEIV.2006.357395","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357395","url":null,"abstract":"In these days, the damage of hot springs quality by bacilli is getting serious problem. The bacilli can be killed out by heating, chlorination or ultraviolet rays irradiation in general. However, some of bacilli have the tolerance in heat and chlorine, on the other hand they do not have the tolerance in ultraviolet rays. Therefore, most bacilli can be killed out by using ultraviolet rays (Yoshino, 2004). The wavelength of effective ultraviolet rays for sterilization is in the vicinity of 250 nm. Mercury has a spectrum with strong resonance wavelength 253.7 nm. Therefore, mercury is used for the ultraviolet source. However, there are strong needs to reduce harmful mercury, because mercury can cause environmental problems. Then, the authors have paid attention to XeI emitting the radiation of 253 nm, which is near resonance radiation (253.7 nm) of mercury. In this study, the authors investigated the characteristics of the ultraviolet-rays light source that used XeI. Dielectric barrier discharge (DBD) is used as a lighting method. Parameter of xenon filling pressure was 39.9 Pa or 1.33 kPa. The vapor pressure of the iodine in the discharge tube was assumed to be 46.6 Pa from the temperature of the discharge tube wall. Two aluminum tapes (60 mm long and 20 mm wide) have been set in the opposite position of the outer wall of a discharge tube to each other as external electrodes. And the sinusoidal wave voltage or the pulsed negative voltage was impressed to the external electrode. By the dielectric barrier discharge, XeI excimers were generated and radiation around 253 nm from XeI was obtained. Consequently, when the partial pressure of the xenon was low, the continuous spectrum (peak wavelength 342 nm) from the iodine molecule was strongly radiated. However, when the partial pressure of the xenon was high, the continuous spectrum (peak wavelength 253 nm) from XeI was strongly radiated","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128259608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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