Classification of Commercial SiC-MOSFETs Based on Time-Dependent Gate-current Characteristics

E. Murakami, T. Takeshita, K. Oda, M. Kobayashi, K. Asayama, M. Okamoto
{"title":"Classification of Commercial SiC-MOSFETs Based on Time-Dependent Gate-current Characteristics","authors":"E. Murakami, T. Takeshita, K. Oda, M. Kobayashi, K. Asayama, M. Okamoto","doi":"10.1109/IRPS48203.2023.10117833","DOIUrl":null,"url":null,"abstract":"SiC-MOSFETs with high reliability have been desired for electric vehicles. We classify commercial SiC-MOSFETs into “heavily nitrided” and “lightly nitrided” based on time-dependent gate-current characteristics of fabricated devices. In “heavily nitrided” devices for higher mobility, high-voltage gate pulse for screening of B-mode (extrinsic defects) causes hole-trapping near the SiO2/SiC interface through impact ionization. This phenomenon leads to an increase in gate current as well as a negative shift of threshold voltage. Moreover, this is enhanced at low temperatures (-60, 25°C). Thus, high-temperature (200°C) screening is preferable. In addition, the relation between Weibull slopes for time-to-breakdown and charge-to-breakdown is closely examined.","PeriodicalId":159030,"journal":{"name":"2023 IEEE International Reliability Physics Symposium (IRPS)","volume":"76 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS48203.2023.10117833","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

SiC-MOSFETs with high reliability have been desired for electric vehicles. We classify commercial SiC-MOSFETs into “heavily nitrided” and “lightly nitrided” based on time-dependent gate-current characteristics of fabricated devices. In “heavily nitrided” devices for higher mobility, high-voltage gate pulse for screening of B-mode (extrinsic defects) causes hole-trapping near the SiO2/SiC interface through impact ionization. This phenomenon leads to an increase in gate current as well as a negative shift of threshold voltage. Moreover, this is enhanced at low temperatures (-60, 25°C). Thus, high-temperature (200°C) screening is preferable. In addition, the relation between Weibull slopes for time-to-breakdown and charge-to-breakdown is closely examined.
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基于时变门电流特性的商用sic - mosfet分类
具有高可靠性的sic - mosfet一直是电动汽车所需要的。我们将商用sic - mosfet分为“重氮化”和“轻氮化”基于制造器件的时间依赖性门电流特性。在高迁移率的“重氮化”器件中,用于筛选b模(外在缺陷)的高压栅极脉冲通过冲击电离在SiO2/SiC界面附近引起空穴捕获。这种现象导致栅极电流的增加以及阈值电压的负移。此外,这在低温(- 60,25°C)下得到增强。因此,优选高温(200°C)筛选。此外,还研究了击穿时间和电荷击穿的威布尔斜率之间的关系。
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