Y. Hirano, T. Iwamatsu, K. Shiga, K. Nii, K. Sonoda, T. Matsumoto, S. Maeda, Y. Yamaguchi, T. Ipposhi, S. Maegawa, Y. Inoue
{"title":"High soft-error tolerance body-tied SOI technology with partial trench isolation (PTI) for next generation devices","authors":"Y. Hirano, T. Iwamatsu, K. Shiga, K. Nii, K. Sonoda, T. Matsumoto, S. Maeda, Y. Yamaguchi, T. Ipposhi, S. Maegawa, Y. Inoue","doi":"10.1109/VLSIT.2002.1015383","DOIUrl":null,"url":null,"abstract":"It was proven that the body-tied SOI technology with partial trench isolation (PTI) has significant high soft-error immunity. As compared with the bulk, a three-order reduction of the soft-error rate for a 0.18 /spl mu/m SOI 4 Mbit SRAM with the PTI was successfully realized by the balanced combination of the SOI thickness and well resistance. It is estimated that the soft-error immunity for the floating-body device degrades because large charge collection is induced by not only the body strike but also the drain strike. A design guideline of the SOI structure to suppress soft errors is presented. According to the guideline, beyond 0.13 /spl mu/m node, high soft-error immunity for the body-tied SOI device was projected as compared with the bulk as well as the body-floating SOI device.","PeriodicalId":103040,"journal":{"name":"2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2002.1015383","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
It was proven that the body-tied SOI technology with partial trench isolation (PTI) has significant high soft-error immunity. As compared with the bulk, a three-order reduction of the soft-error rate for a 0.18 /spl mu/m SOI 4 Mbit SRAM with the PTI was successfully realized by the balanced combination of the SOI thickness and well resistance. It is estimated that the soft-error immunity for the floating-body device degrades because large charge collection is induced by not only the body strike but also the drain strike. A design guideline of the SOI structure to suppress soft errors is presented. According to the guideline, beyond 0.13 /spl mu/m node, high soft-error immunity for the body-tied SOI device was projected as compared with the bulk as well as the body-floating SOI device.