High soft-error tolerance body-tied SOI technology with partial trench isolation (PTI) for next generation devices

Y. Hirano, T. Iwamatsu, K. Shiga, K. Nii, K. Sonoda, T. Matsumoto, S. Maeda, Y. Yamaguchi, T. Ipposhi, S. Maegawa, Y. Inoue
{"title":"High soft-error tolerance body-tied SOI technology with partial trench isolation (PTI) for next generation devices","authors":"Y. Hirano, T. Iwamatsu, K. Shiga, K. Nii, K. Sonoda, T. Matsumoto, S. Maeda, Y. Yamaguchi, T. Ipposhi, S. Maegawa, Y. Inoue","doi":"10.1109/VLSIT.2002.1015383","DOIUrl":null,"url":null,"abstract":"It was proven that the body-tied SOI technology with partial trench isolation (PTI) has significant high soft-error immunity. As compared with the bulk, a three-order reduction of the soft-error rate for a 0.18 /spl mu/m SOI 4 Mbit SRAM with the PTI was successfully realized by the balanced combination of the SOI thickness and well resistance. It is estimated that the soft-error immunity for the floating-body device degrades because large charge collection is induced by not only the body strike but also the drain strike. A design guideline of the SOI structure to suppress soft errors is presented. According to the guideline, beyond 0.13 /spl mu/m node, high soft-error immunity for the body-tied SOI device was projected as compared with the bulk as well as the body-floating SOI device.","PeriodicalId":103040,"journal":{"name":"2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2002.1015383","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

Abstract

It was proven that the body-tied SOI technology with partial trench isolation (PTI) has significant high soft-error immunity. As compared with the bulk, a three-order reduction of the soft-error rate for a 0.18 /spl mu/m SOI 4 Mbit SRAM with the PTI was successfully realized by the balanced combination of the SOI thickness and well resistance. It is estimated that the soft-error immunity for the floating-body device degrades because large charge collection is induced by not only the body strike but also the drain strike. A design guideline of the SOI structure to suppress soft errors is presented. According to the guideline, beyond 0.13 /spl mu/m node, high soft-error immunity for the body-tied SOI device was projected as compared with the bulk as well as the body-floating SOI device.
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用于下一代器件的具有部分沟槽隔离(PTI)的高软误差容限体系SOI技术
实验证明,带部分沟槽隔离(PTI)的体系SOI技术具有显著的高软误差抗扰性。与普通SRAM相比,采用PTI的0.18 /spl mu/m SOI 4mbit SRAM,通过平衡SOI厚度和井阻,成功地将软误差率降低了3个数量级。据估计,由于浮体撞击和漏极撞击都会引起大量电荷收集,导致浮体装置的软误差抗扰度下降。提出了一种抑制软误差的SOI结构设计准则。根据指南,在0.13 /spl mu/m节点以上,与体系SOI器件和浮体SOI器件相比,体系SOI器件预计具有较高的软误差抗免疫力。
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