Effect of bridging groups of precursors on modulus improvement in plasma co-polymerized low-k films

N. Kunimi, J. Kawahara, A. Nakano, K. Kinoshita, Y. Hayashi, M. Komatsu, Y. Seino, R. Ichikawa, Y. Takasu, T. Kikkawa
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Abstract

We have demonstrated that the mechanical strength of organic silica low-k films can be enhanced by introducing a reinforcement monomer in a matrix monomer under plasma excitation. The modulus improvement mechanism was investigated by analyzing the film structure. Pyrolysis gas chromatography / mass spectrometry (Py-GC/MS) revealed incorporation of a reinforcement monomer in the matrix through co-polymerization reactions. Compositional analysis of the films showed that the extent of reinforcement is associated with co-polymerization ratio or the monomer content in the film. It is also indicated that the modulus enhancement depends on the content of 3D aromatic bridge structure, which is affected by the chemical structure of the reinforcement monomers.
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前驱体桥接基团对等离子体共聚低钾薄膜模量改善的影响
我们已经证明,在等离子体激发下,在基体单体中引入增强单体可以提高有机二氧化硅低k薄膜的机械强度。通过对薄膜结构的分析,探讨了模量提高的机理。热解气相色谱/质谱分析(Py-GC/MS)发现,通过共聚合反应,增强单体在基质中掺入。膜的组成分析表明,膜的增强程度与共聚合比或膜中单体含量有关。模量的增强取决于三维芳桥结构的含量,而芳桥结构的含量受增强单体化学结构的影响。
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