Novel Approach to MOS Inversion Layer Mobility Characterization with Advanced Split C-V and Hall Factor Analyses

A. Toriumi, K. Kita, H. Irie
{"title":"Novel Approach to MOS Inversion Layer Mobility Characterization with Advanced Split C-V and Hall Factor Analyses","authors":"A. Toriumi, K. Kita, H. Irie","doi":"10.1109/IEDM.2006.346874","DOIUrl":null,"url":null,"abstract":"Parasitic effects and Matthiessen's rule have been reinvestigated in the inversion layer mobility analysis. It is shown that an advanced split C-V technique newly developed is very useful for characterizing the intrinsic inversion layer mobility in short channel MOSFETs, even with very large parasitic effects. Furthermore, the validity of Matthiessen's rule is experimentally and theoretically investigated through Hall factor analysis","PeriodicalId":366359,"journal":{"name":"2006 International Electron Devices Meeting","volume":"95 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2006.346874","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

Abstract

Parasitic effects and Matthiessen's rule have been reinvestigated in the inversion layer mobility analysis. It is shown that an advanced split C-V technique newly developed is very useful for characterizing the intrinsic inversion layer mobility in short channel MOSFETs, even with very large parasitic effects. Furthermore, the validity of Matthiessen's rule is experimentally and theoretically investigated through Hall factor analysis
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
用先进的分割C-V和霍尔因子分析表征MOS反转层迁移率的新方法
在逆温层迁移率分析中,重新研究了寄生效应和Matthiessen规则。结果表明,新开发的一种先进的分割C-V技术对于表征短沟道mosfet的本征反转层迁移率非常有用,即使寄生效应非常大。通过霍尔因子分析,从实验和理论上考察了马西森规则的有效性
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Plenary Session High Density 3-D Integration Technology for Massively Parallel Signal Processing in Advanced Infrared Focal Plane Array Sensors 1.5 μm Emission from a Silicon MOS-LED Based on a Dislocation Network 1T MEMS Memory Based on Suspended Gate MOSFET Ultra High-speed Novel Bulk Thyristor-SRAM (BT-RAM) Cell with Selective Epitaxy Anode (SEA)
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1