Hole capture cross section of the deep Ti donor level in InP

H. Scheffler, N. Baber, A. Dadgar, T. Wolf, D. Bimberg
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引用次数: 0

Abstract

The hole capture cross section /spl sigma//sub p/ of the deep Ti/sup 3+//Ti/sup 4+/ donor level in InP has been measured as a function of temperature. Two different capacitance spectroscopy techniques have been used, namely deep level transient spectroscopy and an isothermal capacitance measurement method for capture measurements at high and low temperatures, respectively. /spl sigma//sub p/ has been found to increase with temperature from 2.8 /spl times/ 10/sup -23/ cm/sup 2/ at 100 K to 2.7 /spl times/ 10/sup -22/ at 300 K, in agreement with a multiphonon emission process. The capture barrier for hole capture amounts to (30/spl plusmn/5) meV.<>
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InP中深部Ti供体能级的空穴捕获截面
测量了InP中深Ti/sup 3+//Ti/sup 4+/供体能级的孔捕获截面/spl sigma//sub p/作为温度的函数。两种不同的电容光谱技术,即深能级瞬态光谱和等温电容测量方法,分别用于高温和低温下的捕获测量。发现/spl sigma//sub p/随温度升高,从100 K时的2.8 /spl倍/ 10/sup -23/ cm/sup 2/增加到300 K时的2.7 /spl倍/ 10/sup -22/,与多声子发射过程一致。空穴捕获势垒为(30/spl + usmn/5) meV。
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