Multi-wafer MOCVD growth of highly uniform InGaAsP strained quantum well structure for low threshold 1.3 /spl mu/m lasers

Abstract

The authors demonstrated a successful multi-wafer growth for the 1.3 /spl mu/m InGaAsP strained multiple quantum well (MQW) lasers. Excellent uniformity of composition and thickness was realized by optimizing the growth conditions. The standard deviation of photoluminescence (PL) wavelength of InGaAsP layer over a 2 inch wafer is 4 nm, which is the lowest value for the multi-wafer growth. For a strained MQW structure, the standard deviation in PL wavelength of 7nm has been obtained. Buried-heterostructure lasers have been fabricated using the multi-wafer metal-organic chemical vapor deposition growth. The lasers exhibit very low threshold current over wide temperature range and low operating current of 26 mA was obtained even at 80/spl deg/C with 5 mW continuous wave (CW) output.<>