On the Mechanism of the Anomalous Acceleration of Ions in Vacuum and Plasma Diodes

D. Shmelev, S. Barengolts
{"title":"On the Mechanism of the Anomalous Acceleration of Ions in Vacuum and Plasma Diodes","authors":"D. Shmelev, S. Barengolts","doi":"10.1109/DEIV.2006.357231","DOIUrl":null,"url":null,"abstract":"A new mechanism of the anomalous acceleration of ions at the spark stage of a vacuum discharge is proposed. It has been shown that this acceleration can take place in the presence of a plasma cloud in the electrode gap with strong electronic instability developing in this plasma","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2006.357231","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

A new mechanism of the anomalous acceleration of ions at the spark stage of a vacuum discharge is proposed. It has been shown that this acceleration can take place in the presence of a plasma cloud in the electrode gap with strong electronic instability developing in this plasma
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离子在真空和等离子体二极管中异常加速的机理研究
提出了真空放电火花阶段离子异常加速的新机制。已经证明,这种加速可以在电极间隙中存在等离子体云的情况下发生,等离子体中产生强烈的电子不稳定性
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