In-Product BTI Aging Sensor for Reliability Screening and Early Detection of Material at Risk

T. Brożek, Alberto A. P. Cattaneo, L. Weiland, M. Quarantelli, Alberto Coccoli, S. Saxena, C. Hess, A. Strojwas
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Abstract

We have developed a new reliability monitoring suite, within a proprietary IP block that we call a CV® Core, with aging sensors embedded in the product layout and testable through the product I / O interface. We illustrate the application of the sensor suite with an example of the PMOS NBTI monitor, testable at the wafer level during product electrical wafer sort (EWS), as well after packaging at final test or during burn-in. During EWS, the wafer-level stress test can be used to identify a marginal chip, help material dispositioning for burn-in, or support additional grading for chiplet matching for multi-chip modules. The aging sensors can also be used during the chip lifetime to monitor the device wear-out and alarm users about abnormal silicon aging rates against target mission profile. In this work, we show the wafer level test results for PMOS transistor degradation rates under NBTI stress, within wafer variability, and correlation of degradation rates between sensors stressed under different conditions.
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用于可靠性筛选和危险材料早期检测的产品内BTI老化传感器
我们已经开发了一种新的可靠性监控套件,在一个专有的IP块中,我们称之为CV®Core,老化传感器嵌入到产品布局中,并通过产品I / O接口进行测试。我们以PMOS NBTI监视器为例说明了传感器套件的应用,该监视器在产品电气晶圆排序(EWS)期间,以及封装后的最终测试或老化期间在晶圆级进行测试。在EWS过程中,晶圆级压力测试可用于识别边缘芯片,帮助材料处理老化,或支持多芯片模块的芯片匹配的额外分级。老化传感器还可以在芯片寿命期间监测设备磨损情况,并向用户发出针对目标任务剖面的异常硅老化率警报。在这项工作中,我们展示了在NBTI应力下PMOS晶体管降解率的晶圆级测试结果,在晶圆可变性下,以及不同条件下应力传感器之间降解率的相关性。
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