Epitaxially lifted-off GaAs MESFETs on InP for optoelectronic integration

I. Pollentier, C. Brys, P. Debie, R. Coppoolse, L. Martens, J. Vandewege, P. van Daele, P. Demeester
{"title":"Epitaxially lifted-off GaAs MESFETs on InP for optoelectronic integration","authors":"I. Pollentier, C. Brys, P. Debie, R. Coppoolse, L. Martens, J. Vandewege, P. van Daele, P. Demeester","doi":"10.1109/ICIPRM.1993.380634","DOIUrl":null,"url":null,"abstract":"Epitaxial lift-off (ELO) is a technique by which epitaxially grown layers are lifted off their growth substrate and subsequently reattached to a new one. The preprocessing approach where ELO devices and circuits on the host are fabricated before transplantation offers the advantages that (a) fully optimized devices provided by a foundry service can be combined, (b) the devices can be tested prior to transplantation, and (c) the final result is a monolithic integration. The authors present results on the transplantation of foundry MESFETs to InP, and compare their behavior and the extracted parameters for a nonlinear MESFET-model before and after transfer.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1993 (5th) International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1993.380634","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Epitaxial lift-off (ELO) is a technique by which epitaxially grown layers are lifted off their growth substrate and subsequently reattached to a new one. The preprocessing approach where ELO devices and circuits on the host are fabricated before transplantation offers the advantages that (a) fully optimized devices provided by a foundry service can be combined, (b) the devices can be tested prior to transplantation, and (c) the final result is a monolithic integration. The authors present results on the transplantation of foundry MESFETs to InP, and compare their behavior and the extracted parameters for a nonlinear MESFET-model before and after transfer.<>
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用于光电集成的InP外延提升GaAs mesfet
外延提升(ELO)是一种将外延生长的层从其生长衬底上剥离并随后重新附着在新衬底上的技术。在移植之前制作主机上的ELO设备和电路的预处理方法提供了以下优点:(a)可以组合由代工服务提供的完全优化的设备,(b)可以在移植之前对设备进行测试,以及(c)最终结果是单片集成。作者介绍了铸造mesfet移植到InP的结果,并比较了移植前后mesfet非线性模型的行为和提取的参数。
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