Design and fabrication of SiGe MEMS structures with high intrinsic ESD robustness

{"title":"Design and fabrication of SiGe MEMS structures with high intrinsic ESD robustness","authors":"S. Sangameswaran, V. Cherman, J. de Coster, A. Witvrouw, G. Groeseneken, I. De Wolf","doi":"10.1109/IRPS.2012.6241822","DOIUrl":null,"url":null,"abstract":"The mechanical response of electrostatically-actuated MEMS to ESD stress leads to contact breakdown or to discharges across micro-gaps. This is the root cause of most MEMS failures under ESD stress. This paper discusses improvement of the intrinsic ESD robustness of SiGe MEMS from Class0 (<;250V) to more than Class1 (>;500V), through smart design variations and higher mechanical stiffness. A MEMS-based one-time ESD-protection fuse with pre-defined trigger voltage is shown as an application.","PeriodicalId":341663,"journal":{"name":"2012 IEEE International Reliability Physics Symposium (IRPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2012.6241822","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The mechanical response of electrostatically-actuated MEMS to ESD stress leads to contact breakdown or to discharges across micro-gaps. This is the root cause of most MEMS failures under ESD stress. This paper discusses improvement of the intrinsic ESD robustness of SiGe MEMS from Class0 (<;250V) to more than Class1 (>;500V), through smart design variations and higher mechanical stiffness. A MEMS-based one-time ESD-protection fuse with pre-defined trigger voltage is shown as an application.
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高ESD稳健性SiGe MEMS结构的设计与制造
静电驱动的MEMS对ESD应力的机械响应导致接触击穿或跨微间隙放电。这是大多数MEMS在ESD压力下失效的根本原因。本文讨论了通过智能设计变化和更高的机械刚度,从Class0 (;500V)开始提高SiGe MEMS的固有ESD稳健性。一种基于mems的一次性esd保护熔断器,具有预先定义的触发电压。
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