RF measurement of impact ionization and its temperature dependence in AlSb/InAs HEMTs

W. Kruppa, J. B. Boos
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引用次数: 9

Abstract

The RF characteristics of impact ionization in AlSb/InAs HEMTs were examined by measuring the behavior of S/sub 22/ in the frequency range from 300 kHz to 3 GHz. By varying the drain bias, the onset of impact ionization can be clearly observed. In the ionization region, high gate current, inductive output impedance, current instability with hysteresis, and an increase in low-frequency noise were observed. With decreasing temperature, these effects diminish. The results were compared with measurements made on InAlAs/InGaAs/InP HEMTs. In both transistors, impact ionization as well as deep-level trapping were observed.<>
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AlSb/InAs hemt中冲击电离的射频测量及其温度依赖性
通过测量S/sub 22/在300 kHz ~ 3 GHz频率范围内的行为,研究了AlSb/InAs hemt中撞击电离的射频特性。通过改变漏极偏压,可以清楚地观察到冲击电离的开始。在电离区,观察到高栅极电流、电感输出阻抗、电流不稳定和迟滞,以及低频噪声的增加。随着温度的降低,这些影响逐渐减弱。结果与InAlAs/InGaAs/InP hemt的测量结果进行了比较。在这两个晶体管中,都观察到撞击电离和深能级俘获
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Comparisons between conventional LEC, VCZ and VGF for the growth of InP crystals Reliability of InP-based HBT's and HEMT's: experiments, failure mechanisms, and statistics Bulk InP technologies: InP against GaAs Improvement of InAlAs/InP heterointerface grown by MOVPE by using thin AlP layer Low pressure pyrolysis of alternative phosphorous precursors for chemical beam epitaxial growth of InP and related compounds
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