Depression of Insulator Charging in Vacuum by Partial Mechanical Processing

O. Yamamoto, S. Markon, H. Morii, H. Omura
{"title":"Depression of Insulator Charging in Vacuum by Partial Mechanical Processing","authors":"O. Yamamoto, S. Markon, H. Morii, H. Omura","doi":"10.1109/DEIV.2006.357252","DOIUrl":null,"url":null,"abstract":"This paper describes experimental results on surface charging of partially mechanically processed insulators in vacuum. The charging phenomena were observed when insulators were exposed to a ramped dc voltage, by using a capacitive probe embedded in the cathode. First, we examined a partially roughened cylindrical insulator. The height of the roughened surface measured from the cathode, was varied while keeping the total length of the insulator constant. Second, in the same way, we examined a cylindrical insulator having a truncated conical frustum or a chamfer at its cathode-side end. Based on these experiments we have proved that the partial mechanical processing is effective for suppressing insulator charging in vacuum","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"144 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2006.357252","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

This paper describes experimental results on surface charging of partially mechanically processed insulators in vacuum. The charging phenomena were observed when insulators were exposed to a ramped dc voltage, by using a capacitive probe embedded in the cathode. First, we examined a partially roughened cylindrical insulator. The height of the roughened surface measured from the cathode, was varied while keeping the total length of the insulator constant. Second, in the same way, we examined a cylindrical insulator having a truncated conical frustum or a chamfer at its cathode-side end. Based on these experiments we have proved that the partial mechanical processing is effective for suppressing insulator charging in vacuum
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局部机械加工对真空中绝缘子充放电的抑制
本文介绍了真空条件下部分机械加工绝缘子表面充电的实验结果。通过在阴极中嵌入电容探针,观察到当绝缘体暴露于直流斜坡电压时的充电现象。首先,我们检查了一个部分粗糙的圆柱形绝缘体。在保持绝缘子总长度不变的情况下,从阴极测得的粗化表面的高度发生变化。其次,以同样的方式,我们检查了一个圆柱形绝缘体,在其阴极端有截断的锥形截锥或倒角。通过这些实验,我们证明了局部机械处理对抑制真空中绝缘子带电是有效的
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