{"title":"Defect risks in chemically amplified resists used for extreme ultraviolet lithography","authors":"T. Kozawa","doi":"10.1117/12.2643012","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Extreme Ultraviolet Lithography 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2643012","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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