Properties of heteroepitaxial InP solar cells at variable proton energies

I. Weinberg, C. K. Swartz, H. Curtis, D. Brinker, C. Vargas-Aburto
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Abstract

InP solar cells, epitaxially grown on GaAs substrates with intervening Ga/sub x/In/sub 1-x/As layers, were irradiated by protons over a range of energies from 10 to 0.5 MeV. Cell performance, temperature dependencies and carrier removal were determined over this energy range. The superior radiation resistance of these cells was due to an excessively small pre-irradiation diffusion length, attributable to a high dislocation density. This latter factor was also found to be dominant in the temperature dependency of open circuit voltage. Carrier removal was found to be inversely proportional to energy while radiation resistance decreased with decreasing proton energy, the proton range being the dominant factor in determining the behavior of these cell properties.<>
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变质子能下异质外延InP太阳能电池的性能
在GaAs衬底上外延生长的InP太阳能电池,中间有Ga/sub x/In/sub 1-x/As层,用能量在10到0.5 MeV范围内的质子照射。在此能量范围内确定了电池性能,温度依赖性和载流子去除。由于位错密度高,辐照前扩散长度过小,因此具有优异的抗辐射性能。后一个因素也被发现在开路电压的温度依赖性中占主导地位。发现载流子的去除与能量成反比,而辐射阻力随着质子能量的降低而降低,质子范围是决定这些细胞特性行为的主要因素。
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