Effect of Primary Knocked-on Atoms on Conductivity Compensation in N-type 4H-SiC Irradiated by 1 MeV Electrons, 25 MeV C Ions and 40 MeV Si Ions

Guoliang Ma, Yanqing Zhang, Heyi Li, Chaoming Liu, Chunhua Qi, Yidan Wei, Tianqi Wang, S. Dong, Mingxue Huo
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引用次数: 1

Abstract

The conductivity recombination mechanism of different ions irradiation was investigated in n-type 4H-SiC Schottky diode. The incident ions were selected as 1 MeV electrons, 25 MeV C and 40 MeV Si ions, respectively. The primaiy knocked-on atoms (PKAs) distribution in the irradiated 4H-SiC is calculated by SRIM code. After irradiation, the carrier concentration changed significantly. Compared with virous particles irradiation, it is indicated that the carrier removal rates under these three irradiation conditions are greatly different. Based on the theoretical analysis, different conductivity compensation brought by different defect status is the major reason for the significant difference in carrier removal rate.
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初敲原子对1 MeV电子、25 MeV C离子和40 MeV Si离子辐照n型4H-SiC电导率补偿的影响
研究了不同离子辐照下n型4H-SiC肖特基二极管的电导率复合机理。入射离子分别为1 MeV电子、25 MeV C离子和40 MeV Si离子。用SRIM程序计算了辐照后的4H-SiC中的主敲入原子(pka)分布。辐照后载流子浓度变化明显。与病毒颗粒辐照相比,三种辐照条件下的载体去除率差异较大。理论分析表明,不同缺陷状态带来的不同电导率补偿是导致载流子去除率显著差异的主要原因。
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