One time programming device yield study based on anti-fuse gate oxide breakdown on p-type and n-type substrates

N. Mathur, Y. Ahn, I. Kouznetov, F. Jenne, J. Fulford
{"title":"One time programming device yield study based on anti-fuse gate oxide breakdown on p-type and n-type substrates","authors":"N. Mathur, Y. Ahn, I. Kouznetov, F. Jenne, J. Fulford","doi":"10.1109/IRWS.2005.1609576","DOIUrl":null,"url":null,"abstract":"A study on the programming yield of one time programmable (OTP) device based on anti-fuse gate oxide breakdown on p-type and n-type substrates is presented. Charge injection into anti-fuse gate oxide from the substrate during OTP programming can alter device characteristics, which impact the OTP programming yield. Experiments showed higher programming yield with increasing anti-fuse gate read current can be obtained with the OTP device based on anti-fuse gate oxide breakdown on n-type substrate compared to p-type substrate due to less electron-hole pair generation.","PeriodicalId":214130,"journal":{"name":"2005 IEEE International Integrated Reliability Workshop","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE International Integrated Reliability Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.2005.1609576","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

A study on the programming yield of one time programmable (OTP) device based on anti-fuse gate oxide breakdown on p-type and n-type substrates is presented. Charge injection into anti-fuse gate oxide from the substrate during OTP programming can alter device characteristics, which impact the OTP programming yield. Experiments showed higher programming yield with increasing anti-fuse gate read current can be obtained with the OTP device based on anti-fuse gate oxide breakdown on n-type substrate compared to p-type substrate due to less electron-hole pair generation.
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基于p型和n型衬底抗熔丝栅氧化物击穿的一次性编程器件成品率研究
研究了p型和n型衬底上基于抗熔丝栅氧化物击穿的一次性可编程器件的编程成品率。在OTP编程过程中,从衬底向反熔丝栅氧化物注入电荷会改变器件的特性,从而影响OTP编程的良率。实验表明,与p型衬底相比,基于n型衬底的反熔丝栅氧化物击穿的OTP器件由于产生的电子空穴对更少,可以获得更高的编程产率和更高的反熔丝栅读电流。
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